Tunable infrared transparent conductive film with photovoltaic function and preparation method thereof
A technology of transparent conductive film and transparent conductive layer, which is applied in photovoltaic power generation, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problems of single function of infrared transparent conductive film and low transmittance in the infrared region of electrodes, and achieve effective photovoltaic power generation function, increase the range of options, and solve the effect of a single function
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[0041] The steps of the preparation method of the tunable infrared transparent conductive film with photovoltaic function of the present invention are as follows:
[0042] Step 1), preparing an infrared transparent conductive layer 2 on a flat substrate 1;
[0043] Step 2), preparing a photovoltaic functional layer 3 on the infrared transparent conductive layer 2;
[0044] Step 3), preparing a tunable infrared transparent conductive layer 4 on the photovoltaic functional layer 3;
[0045] The material of the infrared transparent conductive layer 2 is an indium cerium oxide transparent conductive film.
[0046] The material of the photovoltaic functional layer 3 is organic or perovskite material.
[0047] The material of the tunable infrared transparent conductive layer 4 is a multilayer transparent conductive film with a dielectric / metal / dielectric structure.
[0048] Specifically, the preparation method of the tunable infrared transparent conductive film with photovoltaic fu...
Embodiment 1
[0063] 1) Put the cleaned 1 mm thick glass plane substrate together with the strip mask into the electron beam vacuum coating equipment, and vacuumize it. When the vacuum degree is 2×10 -3 Pascal, set the substrate temperature to 300°C, adjust the ion source argon-oxygen pressure ratio to 2:1, evaporate at a rate of 0.5 nm / s, and evaporate an infrared transparent conductive layer of 150 nm indium cerium oxide transparent conductive film, wherein the content of cerium is 5 %.
[0064] 2) After the evaporation is completed and the substrate is cooled, take it out and place it in the ultraviolet ozone treatment equipment for 5 minutes. Then take it out and transfer it to the glove box, and place it on the bracket of the spin coater, drop the stirred organic solution evenly on the above-mentioned substrate, adjust the spin coater speed to 1000 rpm, and spin coat for 1 minute to obtain 80 The nanometer-thick photovoltaic functional layer was placed on a hot stage in a glove box an...
Embodiment 2
[0069] 1) Put the cleaned 1 mm thick glass plane substrate together with the strip mask into the electron beam vacuum coating equipment, and vacuumize it. When the vacuum degree is 2×10 -3 Pascal, set the substrate temperature to 300°C, adjust the ion source argon-oxygen pressure ratio to 2:1, evaporate at a rate of 0.5 nm / s, and evaporate an infrared transparent conductive layer of 150 nm indium cerium oxide transparent conductive film, wherein the content of cerium is 5 %.
[0070] 2) After the evaporation is completed and the substrate is cooled, take it out and place it in the ultraviolet ozone treatment equipment for 5 minutes. Then take it out and transfer it to the glove box, and place it on the bracket of the spin coater, drop the stirred organic solution evenly on the above-mentioned substrate, adjust the spin coater speed to 1000 rpm, and spin coat for 1 minute to obtain 80 The nanometer-thick photovoltaic functional layer was placed on a hot stage in a glove box an...
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