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Tank body cleaning, maintenance and maintenance method and tank cleaning system

A technology of cleaning tank and tank body, which is used in cleaning tank system, tank cleaning, maintenance and maintenance of mask glass substrate cleaning. problems, to ensure the cleaning yield, avoid yield fluctuations, and avoid secondary pollution.

Active Publication Date: 2021-06-25
湖南普照信息材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the sewage discharge effect of this method is poor, and the untreated contamination will cause secondary pollution. After cleaning, the cleaning yield will often drop, and even the cleaning yield will drop to 0%, and the cleaning yield will fluctuate greatly.

Method used

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  • Tank body cleaning, maintenance and maintenance method and tank cleaning system
  • Tank body cleaning, maintenance and maintenance method and tank cleaning system

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Embodiment Construction

[0043] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0044] The core of the present invention is to provide a tank cleaning, maintenance and maintenance method, which effectively ensures the cleaning yield of the cleaning tank, avoids the fluctuation of the yield rate after tank cleaning, and avoids the adverse defects caused by the growth of microorganisms on the glass substrate .

[0045] The present invention also provides a cleaning tank system for implementing the above method.

[0046] Please refer to F...

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Abstract

The invention discloses a tank body cleaning, maintenance and maintenance method. Circulating flow between the inner tank until there are no obvious black impurities and a large number of lotion bubbles in the inner tank; empty the cleaning tank, inject new pure water into the inner tank and control the continuous water output of the outer tank to clean the outer tank; The cleaning tank is sterilized and the cleaning tank is tested for bacteria; the cleaning tank is emptied, and the cleaning tank is filled with new pure water, thus effectively ensuring the cleaning yield of the cleaning tank and avoiding the yield fluctuation after the tank is cleaned. , and also avoids microbial growth causing undesirable defects on the glass substrate. In addition, the present invention also discloses a cleaning tank system for implementing the above method.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, and more specifically relates to a tank body cleaning, maintenance and maintenance method for cleaning mask plate glass substrates. Furthermore, the invention also relates to a cleaning tank system for the above method. Background technique [0002] In the manufacture of semiconductor chips or integrated circuits, the manufacture of masks is a key process connecting layout manufacturing and wafer manufacturing. In the manufacturing process of the mask plate, the defects of the glass substrate itself and the fine contamination on the surface account for 70%-80% of the yield loss. [0003] Therefore, in order to remove stains on the glass substrate, the glass substrate is usually cleaned by "ultrasonic wave + lotion", supplemented by SPM solution cleaning and pure water rinsing. Among them, the "ultrasonic + lotion" method of cleaning removed more than 90% of the stains on the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B9/08B08B9/093A61L2/18A61L2/28
CPCA61L2/186A61L2/28A61L2202/17A61L2202/23B08B9/08B08B9/083B08B9/093
Inventor 李翼李伟杨旭
Owner 湖南普照信息材料有限公司