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Photochromic material with high fatigue resistance

A photochromic material and photochromic technology, applied in the direction of color-changing fluorescent materials, chemical instruments and methods, etc., can solve the problems of affecting the color rendering effect of photochromic materials, increase the preparation cost, lose the color rendering performance, etc. Fatigue resistance, reduced manufacturing cost, and easy operation

Inactive Publication Date: 2020-05-01
SHENYANG RES INST OF CHEM IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, behind the multiple processes is the increase in preparation costs, and at the cost of losing part of the color rendering performance, in exchange for an increase in service life
In addition, the yellowing of the polymer or the polymer of the microcapsule shell material due to its own aging will also affect the overall color rendering effect of the photochromic material

Method used

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  • Photochromic material with high fatigue resistance
  • Photochromic material with high fatigue resistance
  • Photochromic material with high fatigue resistance

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] High anti-fatigue performance photochromic paste, including the following components:

[0031]

[0032] The preparation method of the high fatigue resistance photochromic material:

[0033] (1) Slurry preparation:

[0034] The resin and the organic solvent are mixed and stirred in a water bath at 50°C in a container. After the resin is dissolved, spirooxazine photochromic molecules and pyridine derivative DMAP are added, and stirred until they are completely dissolved.

[0035] (2) Coating treatment:

[0036] Using a 60 μm wire bar coater, the slurry was coated with three layers of slurry on a medium-speed filter paper, and air-dried at room temperature in the dark.

[0037] At the same time, the photochromic paste with high anti-fatigue performance without adding pyridine derivative DMAP (organic base additive) was used as a control.

Embodiment 2

[0039] High anti-fatigue performance photochromic paste, including the following components:

[0040]

[0041] The preparation method of the high fatigue resistance photochromic material:

[0042] (1) Slurry preparation:

[0043] The resin and the organic solvent are mixed and stirred in a container at 20° C., and after the resin is dissolved, the spirooxazine photochromic molecule and the piperidine derivative PMP are added, and stirred until they are completely dissolved.

[0044] (2) Coating treatment:

[0045] Using a 60 μm wire bar coater, the slurry was coated with three layers of slurry on a medium-speed filter paper, and air-dried at room temperature in the dark.

[0046] At the same time, the photochromic paste with high anti-fatigue performance without adding piperidine derivative PMP (organic base additive) was used as a control.

Embodiment 3

[0048] High anti-fatigue performance photochromic paste, including the following components:

[0049]

[0050] The preparation method of the high fatigue resistance photochromic material:

[0051] (1) Slurry preparation:

[0052] The resin and the organic solvent are mixed and stirred in a water bath at 50° C. in a container. After the resin is dissolved, the photochromic molecule of naphthopyran and the piperidine derivative TMP are added, and stirred until they are completely dissolved.

[0053] (2) Coating treatment:

[0054] Using a 60 μm wire bar coater, the slurry was coated with three layers of slurry on a medium-speed filter paper, and air-dried at room temperature in the dark.

[0055]At the same time, the photochromic paste with high anti-fatigue performance without adding piperidine derivative TMP (organic base additive) was used as a control.

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Abstract

The invention relates to a photochromic material, in particular to a photochromic material with high fatigue resistance. An organic alkali additive is added into the T-shaped photochromic material, and the addition amount of the organic alkali additive accounts for 5-20% of the mass of photochromic molecules. The formula of the photochromic material is improved, and a small amount of anorganic alkali compound is added, so the fatigue resistance of the photochromic material is improved.

Description

technical field [0001] The invention relates to a photochromic material, in particular to a photochromic material with high fatigue resistance. Background technique [0002] Photochromism refers to the phenomenon that the color of a substance changes reversibly after being irradiated with a specific wavelength (mostly ultraviolet light). From the perspective of the fading mechanism, photochromic materials can be divided into P-type photochromic materials and T-type photochromic materials according to whether the fading process requires another beam of specific wavelength light excitation. [0003] T-type photochromic materials mainly include spiropyran, spirooxazine, naphthypyran and other compounds and their derivatives. It can fade spontaneously without being excited by light of a specific wavelength, so it is more widely used. Judging from the summary of current literature reports, it has been applied in many aspects such as clothing, toys, cosmetics, anti-counterfeitin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08L25/06C08L27/06C08L33/12C08K5/357C08K5/3432C08K5/3435C08K5/1545C08K5/17C09K9/02
CPCC08K5/357C08K5/3432C08K5/3435C08K5/1545C08K5/17C09K9/02
Inventor 王瑛杜晓文李学敏白雪松邢颖
Owner SHENYANG RES INST OF CHEM IND
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