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A deep super-resolution laser direct writing system based on gb-sted and its implementation method

A GB-STED, laser direct writing technology, applied in laser welding equipment, metal processing equipment, welding equipment, etc., can solve the problems of anti-spherical aberration, inability to maintain super-resolution ability, etc., and achieve the effect of overcoming spot deformation

Active Publication Date: 2020-11-27
PEKING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In order to overcome the problem that the traditional super-resolution laser direct writing system cannot maintain its super-resolution ability during deep processing, the present invention proposes a GB-STED-based deep super-resolution laser direct writing system and its implementation method, using Gaussian Besser The characteristics of Erguang’s anti-spherical aberration, using the first-order Gaussian Bessel light (GB1) to replace the traditional first-order Laguerre-Gaussian (LG1) as an annihilation light deep super-resolution laser direct writing system, its deep super-resolution ability works in the objective lens maintained within a distance

Method used

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  • A deep super-resolution laser direct writing system based on gb-sted and its implementation method
  • A deep super-resolution laser direct writing system based on gb-sted and its implementation method
  • A deep super-resolution laser direct writing system based on gb-sted and its implementation method

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Embodiment 1

[0052] Such as figure 1 As shown, the deep super-resolution laser direct writing system based on GB-STED in this embodiment includes: an excitation light source 1, an attenuation and protection system 2, a first optical switch S1, a second optical switch S2, and an excitation light beam expansion filter system 3. Beam combining adjustment mirror EM, beam combining mirror 4, annihilation light source 5, adjustable attenuation sheet 6, coupling adjustment mirror DM, annihilation light filtering system 7, Bessel beam generation and spectrum conversion system 8, 0- 2π vortex phase plate 9, annihilation beam expander system 10, first and second thin film beam splitters 11-3 and 11-6, broadband 1 / 4 wave plate 12, objective lens 13, piezoelectric precision three-dimensional mobile platform, illumination System 15, camera 11-1 and signal detector 11-4; wherein, the excitation light source 1 emits femtosecond pulsed light as the excitation light; the height of the excitation light is a...

Embodiment 2

[0063] In this embodiment, the Bessel beam generation and spectrum conversion system uses a spatial light modulator 8-3, a baffle 8-4 and a spectrum conversion lens 8-2. Others are the same as embodiment one.

Embodiment 3

[0065] In this embodiment, the working band of the beam combiner is different from that in the first embodiment, and the beam combiner is a short-pass filter that reflects excitation light and transmits annihilation light. Others are the same as embodiment one.

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Abstract

The invention discloses a GB-STED based deep-layer super-resolution laser direct writing system and an implementation method thereof. A first-order Gaussian-Bessel light beam is adopted as annihilation light, the super-resolution direct writing capacity can still be kept when the system goes deep into a sample, a phase plate is strictly placed on the front focal plane of an annihilation light beamexpanding system, the rear focal plane of the annihilation light beam expanding system strictly coincides with the entrance pupil of an objective lens, and light paths are compact; an annihilation light filtering system adopts polarization maintaining optical fibers, a polarizing film and a half wave plate are eliminated in an annihilation light path, and therefore the influence on light spot shapes is reduced, and it can be guaranteed that emergent light is linear polarized light; exciting light and annihilation light are added into space to be filtered, and therefore light spot shapes during focusing are optimal, and the shape of the direct writing structure can be controlled better; a pair of coupling adjusting reflectors is adopted for adjusting combined beams, and the requirement ofa beam combiner for the more strict incidence angle is met; and a camera is used for observation, rough adjusting is achieved, a signal detector is used for observation, fine adjusting is achieved, and adjusting precision and adjusting efficiency are improved.

Description

technical field [0001] The invention relates to a laser direct writing system, in particular to a GB-STED-based deep super-resolution laser direct writing system and an implementation method thereof. Background technique [0002] In the field of micro-nano processing, compared with ultraviolet exposure, electron beam etching, near-field processing, nanoimprinting and other technologies, laser direct writing is a processing technology that may truly have three-dimensional processing capabilities, flexibility and low cost. Laser direct writing is used in materials such as glass, diamonds, ceramics, and semiconductors. Its main principle is etching, so its application scenarios are limited. This project focuses on new polymer materials, whose basic principle is photopolymerization caused by a series of photophysical and photochemical processes. [0003] Due to the diffraction limit, the minimum linewidth obtained by laser direct writing can only be on the order of half a wavel...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B23K26/362B23K26/0622B23K26/073B23K26/70B23K26/064
CPCB23K26/0622B23K26/064B23K26/0648B23K26/073B23K26/362B23K26/70B23K26/702
Inventor 施可彬邵陈荻于文韬董大山李向平曹耀宇杨宏龚旗煌
Owner PEKING UNIV