Fabrication method of double-layer silicon-based filter based on three-dimensional inductor
A manufacturing method and filter technology, which are applied to semiconductor devices, waveguide-type devices, electric solid-state devices, etc., can solve the problems of low integration density and large size of filters, and achieve the effect of batch production and improved production efficiency.
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[0048] In the following description, specific details such as specific system structures and technologies are presented for the purpose of illustration rather than limitation, so as to thoroughly understand the embodiments of the present invention. It will be apparent, however, to one skilled in the art that the invention may be practiced in other embodiments without these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the present invention with unnecessary detail.
[0049] In order to illustrate the technical solutions of the present invention, specific examples are used below to illustrate.
[0050] figure 1 The implementation flow diagram of the manufacturing method of the double-layer silicon-based filter based on the three-dimensional inductance provided by the embodiment of the present invention is described in detail as follows.
[0051] Step 101 , ma...
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