Optical alignment device and lithography system
An optical alignment and alignment mark technology, applied in the field of photolithography, can solve the problems of reduced scanning signal energy, affecting alignment accuracy, and easy occurrence of optical crosstalk, so as to eliminate interference, improve alignment effect, and improve overlay accuracy. and lithography effects
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Embodiment 1
[0046] Please refer to figure 2 , an embodiment of the present invention provides an optical alignment device, including a light source illumination unit 1, an alignment mark unit 2, an imaging unit 3, a reference mark unit 4, and a signal detection and processing unit (not shown) arranged in sequence along the optical path . Wherein, the alignment mark unit 2 includes at least one narrow mark 20 for optical alignment, and the reference mark unit 4 includes at least one reference grating corresponding to the narrow mark 20 (such as figure 2 41a, 41b), the light source lighting unit 1 is used to emit an illumination beam and transmit it to the narrow mark 20, and the imaging unit 3 is used to image the narrow mark 20 on each of the reference gratings.
[0047] In this embodiment, the alignment mark unit 2 only includes a narrow mark 20 (ie figure 1 101 in), the width of the narrow mark 20 (i.e. figure 1 The width W) of 101 in is generally much smaller than the illumination...
Embodiment 2
[0072] Please refer to Figure 12 , another embodiment of the present invention provides an optical alignment device, and Figure 2 to Figure 11B Compared with the optical alignment device in the first embodiment shown, each light-passing area (i.e., the light-passing hole 320) of the beam-limiting element used to pass through the narrow mark 20 for the diffracted light beam above ±1 order is replaced by a rectangle to Long ellipse, wherein L1 of each light-transmitting area (ie, the light-through hole 320 ) is the length of the long axis of the long ellipse, and L2 is the length of the short axis of the long ellipse. The long elliptical light-transmitting area can also achieve the same technical effect as the rectangular light-transmitting area in Embodiment 1.
[0073] In addition, since other structures of the optical alignment device of this embodiment can be compatible with Figure 2 to Figure 11B The corresponding structures in the optical alignment device in the first...
Embodiment 3
[0077] Please refer to Figure 13 and Figure 14 , another embodiment of the present invention provides an optical alignment device, and Figure 2 to Figure 11BCompared with the optical alignment device in the shown embodiment 1, the alignment mark unit 2 includes more than four diffraction grating-type narrow marks, and these narrow marks are arranged in a two-dimensional manner along the X direction and the Y direction of FIG. 9 . Cross structure, at this time, in order to be able to pass through the ±1 order or more diffracted beams of these narrow marks and receive the image formed by these narrow marks, the beam confinement element is used to pass the ±1 order or more diffracted beams of these narrow marks The arrangement of the light-passing area and the arrangement of the reference grating in the reference mark unit 4 need to match the arrangement structure of all the narrow marks in the alignment mark unit 2, specifically, each light-passing area of the beam limitin...
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