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High-purity gallium particle production technical method

A production process and high-purity technology, applied in the field of high-purity gallium, can solve the problems of high cost and difficulty of high-purity gallium particles, and achieve the effects of simple preparation method, inhibiting oxidation reaction, and improving the purity of gallium particles.

Active Publication Date: 2020-09-15
楚雄川至电子材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to overcome the difficulty and high cost of high-purity gallium grains in the prior art, and provide a production process for high-purity gallium grains, which uses common water as a coolant and prepares gallium with uniform particle diameters at room temperature. High-purity gallium particles, simple preparation method

Method used

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  • High-purity gallium particle production technical method
  • High-purity gallium particle production technical method
  • High-purity gallium particle production technical method

Examples

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Effect test

Embodiment 1

[0024] A method for producing high-purity gallium grains, comprising the steps of:

[0025] S1. Add concentrated hydrochloric acid to the deionized water exchange water to obtain a coolant; melt the high-purity gallium raw material into a liquid state, and put it into a drip bottle; preferably, the resistivity of the deionized water is greater than 16 megohms, and the concentrated hydrochloric acid is exchanged with deionized The volume ratio of water is 1:200; preferably, the melting temperature of the high-purity gallium raw material is 45-55°C, most preferably, the melting temperature of the high-purity gallium raw material is 50°C;

[0026] S2. Place the opening of the dripping bottle in the coolant, the temperature of the coolant is 5-15°C, start dripping, move the dripping bottle horizontally at a speed of 3-9cm / s during the dripping process, the liquid is high-purity The gallium raw material is solidified into high-purity gallium particles after being dropped into the c...

Embodiment 2

[0047] On the basis of Embodiment 1, this embodiment further includes: the height of the liquid high-purity gallium raw material dropping to the bottom of the coolant after being dropped into the coolant is greater than or equal to 25 cm. After researching the production process provided in this example, the inventor found that when the liquid high-purity gallium raw material drops into the coolant during the dropping process and the height of the drop to the bottom of the coolant is too low, the obtained high-purity gallium grains are prone to abnormal shapes. Particles reduce the uniformity of high-purity gallium particles, see Table 4 below for details:

[0048] Table 4 Effect of drop height on high-purity gallium particles

[0049]

[0050] Note: The uniformity in the above table refers to the content of gallium grains with a particle size of ±0.5mm that accounts for the most in the obtained high-purity gallium grains.

[0051] It can be seen from the above table that ...

Embodiment 3

[0053] On the basis of Example 1, this embodiment further includes: the opening diameter of the drip opening of the drip bottle is 0.6-2.6 mm, and high-purity gallium particles with a particle size of 1 mm-10 mm are prepared. Preferably, when the opening aperture of the dripping bottle is 0.8 ± 0.2 mm, high-purity gallium particles with a particle size of 1 to 2 mm are prepared; when the opening aperture of the dripping bottle is 1.2 ± 0.2 mm When the particle size is 0.2 mm, high-purity gallium particles with a particle size of 2 mm to 3 mm are prepared; when the opening diameter of the drop opening of the dripping bottle is 1.6 ± 0.2 mm, high-purity gallium particles with a particle size of 3 mm to 5 mm are prepared. grains; when the opening diameter of the dripping mouth of the dripping bottle is 2±0.2mm, high-purity gallium grains with a particle size of 5mm to 7mm are prepared; when the opening diameter of the dripping opening of the dripping bottle is 2.4±0.2mm mm, high-...

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Abstract

The invention discloses a high-purity gallium particle production technical method. The method comprises the following steps that S1, concentrated hydrochloric acid is added into deionized water exchange water to obtain a coolant; a high-purity gallium raw material is melted into a liquid state and put into a material dripping bottle; S2, a material dripping opening of the material dripping bottleis submerged under the water surface of the coolant, the temperature of the coolant is 5-15 DEG C, material dripping starts, the material dripping bottle is horizontally moved at the speed of 3-9 cm / s in the material dripping process, the liquid-state high-purity gallium raw material is solidified into high-purity gallium particles after the coolant drips, and by adjusting the size of the material dripping opening of the material dripping bottle, the particle size of the prepared high-purity gallium particles is controlled; S3, the high-purity gallium particles are collected and washed with the deionized water exchange water at 10-20 DEG C to be neutral; and S4, the washed high-purity gallium particles are laid in a drying box to be dried, wherein the drying temperature is 13-23 DEG C. Compared with the prior art, the method utilizes common water as the coolant to prepare the high-purity gallium particles uniform in particle size at normal temperature, and the preparation method is simple.

Description

technical field [0001] The invention relates to the field of high-purity gallium, in particular to a production process method of high-purity gallium grains. Background technique [0002] Gallium is a light blue metal that turns into a silvery white liquid at a temperature of 29.76°C. Liquid gallium is very easy to be supercooled, that is, cooled to 0°C without solidification, and the volume of gallium will increase by nearly 3.2% during the process of changing from liquid to solid. High-purity gallium is an important semiconductor basic material. With its series of compounds such as gallium arsenide, gallium phosphide, and gallium aluminum arsenide widely used in high-speed integrated circuits, LEDs, photosensitive elements, photovoltaic solar cells and other fields, high-purity gallium The market demand for gallium is increasing rapidly. Especially in the photovoltaic solar cell industry and other industries that require the use of high-purity gallium as a convenient ing...

Claims

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Application Information

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IPC IPC(8): B22F9/06
CPCB22F9/06
Inventor 曹昌威
Owner 楚雄川至电子材料有限公司
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