A Design Method of Transistor Array Structure Based on Rapid Reliability Test
A transistor array and structure design technology, applied in the field of semiconductor device testing, can solve the problem that the needle depth of different devices cannot be guaranteed to be the same, increase uncertainty, take up test time, etc., to shorten the test cycle, optimize the utilization, and realize the test time. Effect
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[0025] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0026] In the following description, a lot of specific details are set forth in order to fully understand the present invention, but the present invention can also be implemented in other ways different from those described here, and those skilled in the art can do it without departing from the meaning of the present invention. By analogy, the present invention is therefore not limited to the specific examples disclosed below.
[0027] A method for designing a transistor array structure based on a rapid reliability test proposed by the present application includes the following steps:
[0028] (1) A metal-oxide-semiconductor field effect transistor MOSFET is used as a single-tube structure.
[0029] (2) Arrange a number of single-tube...
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