Organosiloxane compound and surface treatment agent
A technology of organosiloxane and compounds, which is applied in the field of organosiloxane compounds, can solve the problems of easily visible fingerprints and low visibility of fingerprints, and achieve low visibility, excellent wear resistance, and reduced friction Effect
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[0384] Hereinafter, synthesis examples, examples, and comparative examples are shown, and the present invention will be described in more detail, but the present invention is not limited by the following examples.
Synthetic example 1
[0386] With ethyl undecylenate 10.0g (4.71 × 10 -2 mol) was heated to 80°C. Next, 1.0×10 toluene solution of chloroplatinic acid / vinylsiloxane complex was added -2 g (based on Pt single substance, containing 0.3×10 - 6 mol), lasted 3 hours to drip 8.6g of trimethoxysilane (7.06×10 -2 mol), heated and stirred for 1 hour. Then, the solvent and unreacted materials were distilled off under reduced pressure to obtain 12.1 g of a compound represented by the following formula (A).
[0387] [chemical 100]
[0388] C 2 h 5 -OOC-(CH 2 ) 10 -Si(OCH 3 ) 3 (A)
[0389] 1 H-NMR
[0390] δ0.8(-(CH 2 ) 7 C H 2 -Si(OCH 3 ) 3 )2H
[0391] δ1.2-1.4(-(C H 2 ) 7 -, -OCH 2 C H 3 )17H
[0392] δ1.6(-OOC-CH 2 C H 2 (CH 2 ) 7 CH 2 -Si-)2H
[0393] δ2.3(-OOC-C H 2 -)2H
[0394] δ3.5(-Si(OC H 3 ) 3 )9H
[0395] δ4.1(-OC H 2 CH 3 )2H
Embodiment 1
[0397] With tetramethyldisiloxane 4.5g (3.4 * 10 -2 mol), 3.6 g of 12N aqueous hydrochloric acid solution, and 2.5 g of 1,4-bis(trifluoromethyl)benzene were cooled to 0°C. Then, drop synthetic in the above-mentioned synthetic example 1 by following formula (A)
[0398] [Chemical 101]
[0399] C 2 h 5 -OOC-(CH 2 ) 10 -Si(OCH 3 ) 3 (A)
[0400] Represented compound 5.0g (1.5×10 -2 mol), aged at 0°C for 6 hours. Then, the lower layer was recovered by a liquid separation operation, and the solvent and unreacted substances were distilled off under reduced pressure to obtain 5.8 g of a product represented by the following formula (B).
[0401] [chemical 102]
[0402]
[0403] 1 H-NMR
[0404] δ0.1-0.2(-Si-C H 3 )18H
[0405] δ0.5(-(CH 2 ) 7 C H 2 -Si(O-Si(CH 3 ) 2 -) 3 )2H
[0406] δ1.2-1.5(-(C H 2 ) 7 -, -OCH 2 C H 3 )17H
[0407] δ1.6(-OOC-CH 2 C H 2 (CH 2 ) 7 CH 2 -Si-)2H
[0408] δ2.3(-OOC-C H 2 -)2H
[0409] δ4.1(-OC H 2 CH 3 )2H ...
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