Semiconductor process equipment and processing method of focusing ring
A process equipment and semiconductor technology, applied in semiconductor/solid-state device manufacturing, discharge tubes, electrical components, etc., can solve the problem of inability to eliminate the etching tilt effect at the edge of the wafer, so as to offset the etching tilt effect and improve the process effect. Effect
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[0036] The embodiment of the present application provides a semiconductor process equipment and a processing method of a focus ring, which are used to solve the problem that the etching tilt effect at the edge of the wafer cannot be eliminated in the prior art.
[0037] In order to enable those skilled in the art to better understand the technical solutions in the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described The embodiments are only some of the embodiments of the present application, but not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without creative efforts shall fall within the scope of protection of this application.
[0038] Fig. 1 (a) is a schematic cross-sectional view of a semiconductor pro...
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