Method for detecting air tightness of ceramic vacuum connector in physical vapor deposition equipment

Abstract

The invention discloses a method for detecting the air tightness of a ceramic vacuum connector in physical vapor deposition equipment. The method is characterized by comprising the following steps: S1, connecting the ceramic vacuum connector with a vacuum interface, and fixing the position; S2, connecting a vacuum interface and vacuumizing to enable the vacuum interface to reach a test state; andS3, detecting and marking the leakage position by using the tracer gas. According to the method, the airtightness condition of the smooth surface of the cleaned vacuum connector can be effectively detected; the awkward situation that the upper machine table cannot be used due to the fact that detection is not performed after cleaning under conventional conditions is solved; the cleaning success rate is improved; meanwhile, the production efficiency of the client is also improved. The invention further provides a vacuum connector air tightness detection device on the pressure controller of thephysical vapor deposition equipment. The device is simple in structure, easy to assemble and low in cost, the device can be operated by common technicians in the field, the production cost is greatlyreduced, and the production efficiency is improved.

Description

technical field [0001] The invention relates to the detection of cleaning effects of equipment and the fields of maintenance and testing of precision equipment, in particular to a method for detecting the airtightness of ceramic vacuum connectors in physical vapor deposition equipment. Background technique [0002] Semiconductor integrated circuit manufacturing technology continues to develop rapidly, and the most commonly used physical vapor deposition technology is vacuum ion plating. When performing ion plating in a vacuum ion coating machine, first fill the reaction chamber of the coating machine with an inert gas, and keep the pressure of the reaction chamber within the range of 10-2 to 10-3 Torr, and then use a voltage of 500-2000 volts to make The inert gas produces a glow discharge. At this time, the glow discharge is the ionization of evaporated metal or alloy vapor, and these ions are accelerated by an electric field and deposited on the substrate. During the above...

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Problems solved by technology

When performing ion plating in a vacuum ion coating machine, first fill the reaction chamber of the coating machine with an inert gas, and keep the pressure of the reaction chamber within the range of 10-2 to 10-3 Torr, and then use a voltage of 500-2000 volts to make The inert gas produces a glow discharge. At this time, the glow discharge is the ionization of evaporated metal or alloy vapor, and these ions are accelerated by an electric field and deposited on the substrate. During the above-mentioned physical vapor deposition process, when there is a reaction When the chamber is not well sealed and outside air enters the reaction chamber, if the air enters the reaction chamber for a long time, the differential pressure detection unit installed in the reaction chamber will detect the pressure change, and will prompt the user by issuing an alarm; When the air in the reaction chamber is low, the differential pressure detection unit cannot detect the air leakage at the first time, but it has actually affected the deposition of ions

[0003] After the conventional cleaning process, the airtightness test of the finished product is not done, which makes the cleaned ceramic vacuum connectors leak after running on the machine, which affects the effect of the machine and greatly reduces the cost of the manufacturing end. efficiency

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