Insulated gate bipolar transistor and manufacturing method thereof
A technology for bipolar transistors and manufacturing methods, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., and can solve the problems that the performance of insulated gate bipolar transistors needs to be improved.
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[0034] The insulated gate bipolar transistor and its manufacturing method proposed by the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. The advantages and features of the present invention will become clearer from the following description. It should be noted that all the drawings are in a very simplified form and use imprecise scales, and are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention.
[0035] Please refer to figure 1 , which is a schematic flowchart of a method for manufacturing an insulated gate bipolar transistor provided by an embodiment of the present invention. Such as figure 1 As shown, the manufacturing method of the insulated gate bipolar transistor includes:
[0036] Step S1: providing a semiconductor substrate, a field oxide layer is formed on the semiconductor substrate, and the field oxide layer covers a part...
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