Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation method for high-temperature-resistant infrared low-emittance coating

A low-emissivity coating and high-temperature-resistant technology, applied in the field of infrared stealth, can solve problems such as poor thermal insulation performance, and achieve the effects of good thermal insulation performance, lower infrared radiation intensity, and lower temperature

Active Publication Date: 2020-12-18
UNIV OF ELECTRONICS SCI & TECH OF CHINA
View PDF5 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Aiming at the deficiencies and existing problems of the existing technology, in order to solve the problem that the coating prepared by plasma spraying is translucent in the 2-14 μm wave band and has poor heat insulation performance at high temperatures, the present invention provides a resistant The preparation method of high-temperature infrared low-emissivity coating selects a material with good heat insulation performance at high temperature, and provides a high-temperature-resistant infrared low-emissivity coating preparation that is impervious to the normal direction in the 2-14μm band method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method for high-temperature-resistant infrared low-emittance coating
  • Preparation method for high-temperature-resistant infrared low-emittance coating
  • Preparation method for high-temperature-resistant infrared low-emittance coating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Example 1: Preparation of a YSZ coating with a thickness of 100 μm.

[0026] (1) Select YSZ powder with a purity of 99.9wt%, put it in a furnace at 90°C and dry it for later use.

[0027] (2) The surface of the graphite substrate is pretreated, and the surface of the substrate is ultrasonically cleaned with acetone and alcohol.

[0028] (3) Carry out spraying step 1 gained YSZ powder on the graphite base prepared in step 2 with plasma spraying technology, prepare YSZ coating, spraying power is 95KW, and spraying distance is 100mm, gas used is argon, nitrogen, hydrogen. Among them, the flow rate of argon gas is 150SCFH, the flow rate of nitrogen gas is 100SCFH, and the flow rate of hydrogen gas is 120SCFH. The thickness of the prepared YSZ coating is 100 μm.

[0029] (4) The YSZ coating prepared by plasma spraying in step 3 is annealed in air, the annealing temperature is 800°C, and the time is 2h.

[0030] The high-temperature low-emissivity coating prepared in Examp...

Embodiment 2

[0031] Example 2: Preparation of a YSZ coating with a thickness of 700 μm.

[0032] (1) Select YSZ powder with a purity of 99.9wt%, put it in a furnace at 90°C and dry it for later use.

[0033] (2) The surface of the graphite substrate is pretreated, and the surface of the substrate is ultrasonically cleaned with acetone and alcohol.

[0034] (3) Carry out spraying step 1 gained YSZ powder on the graphite base prepared in step 2 with plasma spraying technology, prepare YSZ coating, spraying power is 95KW, and spraying distance is 100mm, gas used is argon, nitrogen, hydrogen. Among them, the flow rate of argon gas is 150SCFH, the flow rate of nitrogen gas is 100SCFH, and the flow rate of hydrogen gas is 120SCFH. The thickness of the prepared YSZ coating is 700 μm.

[0035] (4) The YSZ coating prepared by plasma spraying in step 3 is annealed in air, the annealing temperature is 800°C, and the time is 2h.

[0036] The emissivity situation of the high-temperature low-emissivi...

Embodiment 3

[0038] (1) Select YSZ powder and NiCoCrAlY powder with a purity of 99.9wt%, put them into a furnace at 90°C and dry them for later use.

[0039] (2) The surface of the graphite substrate is pretreated, and the surface of the substrate is ultrasonically cleaned with acetone and alcohol.

[0040] (3) carry out spraying step 1 gained YSZ powder and NiCoCrAlY powder on the graphite base prepared in step 2 with plasma spraying technology, prepare YSZ / NiCoCrAlY composite coating, spraying power is 65KW, and spraying distance is 100mm, gas used is Argon, Nitrogen and Hydrogen. Among them, the flow rate of argon gas is 170SCFH, the flow rate of nitrogen gas is 80SCFH, and the flow rate of hydrogen gas is 75SCFH. The thickness of the prepared YSZ coating is 50 μm, and the volume ratio of YSZ to NiCoCrAlY is 1:14.

[0041] (4) carry out spraying step 1 gained YSZ powder on the YSZ / NiCoCrAlY composite coating prepared in step 3 with plasma spraying technology, prepare YSZ coating, spra...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle sizeaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention belongs to the technical field of infrared stealth, and particularly relates to a preparation method for a high-temperature-resistant infrared low-emittance coating. According to the method provided by the invention, the coating does not need to be added with an adhesive, so the emittance is not increased at a high temperature; and moreover, the prepared coating is non-transparent inthe normal direction of 2 microns to 14 microns, and the coating provides benefits to an infrared stealth technology. Besides, a YSZ material is relatively good in heat insulation performance. Therefore, when the YSZ material is applied to preparation of a low-emittance coating, reduction of the temperature of a target surface is facilitated. In this way, the effect of reducing the infrared radiation intensity of an aircraft is doubled. Furthermore, in order to make sure that a YSZ coating is non-transparent in other directions, a YSZ / NiCoCrAIY composite coating is sprayed on a graphite substrate in advance, and then preparation of the YSZ coating and stripping of the graphite substrate are carried out on the surface of the composite coating.

Description

technical field [0001] The invention belongs to the field of infrared stealth technology, in particular to a preparation method of a high temperature resistant infrared low emissivity coating. Background technique [0002] With the rapid development of military technology, infrared stealth technology is becoming more and more important, and the key to infrared stealth is to reduce the infrared radiation intensity of the target. According to Boltzmann's law: Infrared radiation intensity E = εσT 4 , (where ε is the emissivity of the material, T is the thermodynamic temperature of the surface of the object, and σ is the Boltzmann constant). To reduce the intensity of infrared radiation, the most important thing is to reduce the temperature and emissivity of the material, so the preparation of low emissivity and insulation Coatings with good thermal performance are critical. [0003] At present, the main low-emissivity coatings include metal materials and semiconductor materia...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C4/134C23C4/10C23C4/18C23C4/073C23C4/02
CPCC23C4/134C23C4/10C23C4/18C23C4/02C23C4/073
Inventor 张丽殷举航张胤张敏江绍亮王昕谢建良梁迪飞邓龙江
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com