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CVD process-based processing equipment for producing silicon-oxygen negative electrode material

A technology of negative electrode material and processing equipment, which is applied in the field of processing equipment for producing silicon-oxygen negative-electrode materials based on CVD process, can solve the problems of inability to sinter silicon-oxygen negative-electrode battery materials, inability to guarantee production continuity, and potential safety hazards, and achieve sealing The effect of strong durability, good sealing and fast replacement

Pending Publication Date: 2021-02-02
佛山高砂工业窑炉有限公司
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Problems solved by technology

[0010] The invention proposes a processing equipment based on CVD technology for producing silicon-oxygen negative electrode materials, which solves the problems of poor stability, poor air tightness, potential safety hazards, low product qualification rate and continuous production in existing processing equipment. Unable to guarantee, unable to burn silicon-oxygen negative electrode battery materials

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  • CVD process-based processing equipment for producing silicon-oxygen negative electrode material
  • CVD process-based processing equipment for producing silicon-oxygen negative electrode material
  • CVD process-based processing equipment for producing silicon-oxygen negative electrode material

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Embodiment Construction

[0038] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention.

[0039] refer to Figure 1-3 , a processing equipment for producing silicon-oxygen anode materials based on CVD process, including a heating structure, the heating structure includes a heating chamber 3, a gas burner 4, a heating drive motor 5, a heating rotating frame 6 and an auxiliary heating plate 19, An automatic feeder 1 is installed on the side wall of the heating structure, and a sieving structure is installed on the side of the heating structure away from the automatic feeder 1, and the sieving structure includes a sieve plate 7 and a material guide pipe 8. An exhaust structure is installed on the top of the sieve structure, and the exhaust structure includes a...

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Abstract

The invention discloses CVD process-based processing equipment for producing a silicon-oxygen negative electrode material and a CVD process-based equipment-based processing process for producing the silicon-oxygen negative electrode material. The CVD process-based processing equipment structurally comprises a heating structure, the heating structure comprises a heating chamber, a gas burner, a heating driving motor, a heating rotating frame and an auxiliary heating plate, and an automatic feeder is mounted on the side wall of the heating structure. A sieving structure is installed at the side,away from the automatic feeder, of the heating structure and comprises a sieving plate and a material guide pipe, and an exhaust structure is installed at the top end of the sieving structure. The equipment is novel in structure, good in sealing performance, high in heating speed, high in safety, high in maintenance and replacement speed, capable of avoiding air pollution and protecting the atmospheric environment, capable of achieving secondary recycling of raw materials and low in cost. The CVD process-based equipment-based processing process for producing the silicon-oxygen negative electrode material is simple, and mass production of the silicon-oxygen negative electrode material is effectively realized.

Description

technical field [0001] The invention relates to the field of CVD process equipment, in particular to a CVD process-based process equipment for producing silicon-oxygen negative electrode materials. Background technique [0002] When the silicon-oxygen negative electrode material battery material is fired, it is necessary to crack the hydrocarbon gas into carbon and hydrogen at a high temperature in a trace oxygen environment. The carbon deposition is coated on the surface of the silicon-oxygen negative electrode material raw material, and then fired at high After obtaining the product, the CVD process needs to meet the following technical characteristics: [0003] 1), high temperature environment: usually 900 ℃ ~ 1050 ℃; [0004] There are two types of cylinder material, metal material and non-metal material. Due to the manufacturing process, the non-metal material cannot be too large in size, so the output is limited, and it can only be used in small laboratory equipment. ...

Claims

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Application Information

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IPC IPC(8): C23C16/26C23C16/44H01M4/04H01M4/36H01M4/38H01M4/48H01M4/583
CPCC23C16/26C23C16/4409C23C16/4412H01M4/0471H01M4/366H01M4/386H01M4/48H01M4/583Y02E60/10
Inventor 杨伟梅田隆太
Owner 佛山高砂工业窑炉有限公司
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