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Compound polymerization inhibitor for styrene rectification and preparation method thereof

A technology of polymerization inhibitor and styrene, applied in the field of polymerization inhibitor and its preparation, can solve the problems of high toxicity and unfriendly environment, and achieve the effects of low toxicity, environmental friendliness and reduction of polymerization inhibition rate.

Inactive Publication Date: 2021-04-13
CNOOC TIANJIN CHEM RES & DESIGN INST +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

All the disclosed composite inhibitors contain nitrophenol compounds, which are highly toxic and unfriendly to the environment

Method used

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  • Compound polymerization inhibitor for styrene rectification and preparation method thereof
  • Compound polymerization inhibitor for styrene rectification and preparation method thereof
  • Compound polymerization inhibitor for styrene rectification and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] The components of the polymerization inhibitor are as follows:

[0029] 4-carbonyl-2,2,6,6-tetramethylpiperidine nitroxide radical: 10%

[0030] 4-Benzylidene-2,6-di-tert-butyl-2,5-cyclohexadien-1-one: 30%

[0031] Methanol: 27.7%

[0032] Ethylbenzene: 30%

[0033] 2,5,8,11-Tetramethyl-6-dodecyne-5,8-diol 50% solution in dipropylene glycol: 0.3%

Embodiment 2

[0035] The components of the polymerization inhibitor are as follows:

[0036] 4-carbonyl-2,2,6,6-tetramethylpiperidine nitroxide radical: 8.5%

[0037] 4-Benzylidene-2,6-di-tert-butyl-2,5-cyclohexadien-1-one: 35%

[0038] Methanol: 21.2%

[0039] Ethylbenzene: 35%

[0040] 2,5,8,11-Tetramethyl-6-dodecyne-5,8-diol: 0.3%

Embodiment 3

[0042] The components of the polymerization inhibitor are as follows:

[0043] 4-carbonyl-2,2,6,6-tetramethylpiperidine nitroxide radical: 7%

[0044] 4-Benzylidene-2,6-di-tert-butyl-2,5-cyclohexadien-1-one: 40%

[0045] Methanol: 12.7%

[0046] Ethylbenzene: 40%

[0047] 2,5,8,11-Tetramethyl-6-dodecyne-5,8-diol: 0.3%

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PUM

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Abstract

The invention relates to a polymerization inhibitor for styrene rectification and a preparation method thereof. The polymerization inhibitor is composed of a stable free radical type compound, a quinone compound, a tetramethyl alkynediol compound and an organic solvent. The tetramethyl alkynediol compound in the system can promote the dissolution of the stable free radical type compound and the quinones compound in an organic solvent system, so that the polymerization inhibitor has the characteristics of a slow polymerization inhibitor and a true polymerization inhibitor, the polymerization inhibition effect is improved, the tar discharge amount of a styrene device is reduced, and the production capacity of the styrene rectification device is improved.

Description

technical field [0001] The invention relates to a polymerization inhibitor used in a styrene rectification device and a preparation method thereof, belonging to the field of chemical production auxiliary agents. Background technique [0002] The exocyclic double bond of styrene is very active. During the rectification process, free radical polymerization is induced by heat to form a high polymer, which not only consumes styrene monomer and affects product quality, but also the generated polymer will block The equipment and pipelines of the first process seriously threaten the continuous production. In order to reduce the self-polymerization of styrene, in addition to using vacuum operation to reduce the rectification temperature, a polymerization inhibitor is usually added to react with the chain free radicals of styrene to form non-free radical substances or low-activity free radicals that cannot be initiated, so that Polymerization of styrene is terminated. [0003] At p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07C7/20C07C7/04C07C15/46
CPCC07C7/20C07C7/04
Inventor 黄占凯张春丽赵甲赵阳唐亚芳
Owner CNOOC TIANJIN CHEM RES & DESIGN INST