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Mask manufacturing device and manufacturing method

A technology for making a device and a mask, which is applied to measurement devices, optical devices, ion implantation and plating, etc., can solve the problems of difficulty in further improving the production accuracy of metal masks and the retention of production accuracy, so as to improve the production accuracy and improve the The effect of fixing the accuracy and improving the position accuracy

Active Publication Date: 2021-04-23
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the existing FMM production equipment, due to the limitations of the equipment structure and measurement methods, the production accuracy of FMM stays at the level of 2μm-3μm or more, and it is difficult to further improve the production accuracy of the metal mask

Method used

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  • Mask manufacturing device and manufacturing method
  • Mask manufacturing device and manufacturing method

Examples

Experimental program
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Effect test

Embodiment 2

[0111] An embodiment of the present invention provides a mask manufacturing method, which is based on the mask manufacturing device provided in the above embodiments of the present invention, Figure 5 A flow chart of a mask manufacturing method provided by an embodiment of the present invention, such as Figure 5 As shown, the mask making method includes:

[0112] S101. Establish a reference coordinate system.

[0113] Exemplarily, firstly, a reference plane is selected, which is perpendicular to the Z direction. The reference plane may be the plane where the surface of the base is located, the plane where the surface of the moving table is located, the plane where the surface of the gantry beam is located, etc. The embodiment of the present invention is here There is no limitation, as long as the reference plane is perpendicular to the Z direction. Then, a reference coordinate system is established in the reference plane. For example, the geometric center of the mask frame...

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PUM

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Abstract

The invention discloses a mask manufacturing device. The mask manufacturing device comprises a net stretching module used for stretching a mask and conveying the mask to a mask frame, a mask detection module used for detecting the position information of a mask strip on the mask frame, a mask fixing module used for fixing the mask on the mask frame and a first displacement measurement module used for measuring the position information of the net stretching module and the mask fixing module. The position information of the mask detection module is accurately determined through the first displacement measurement module, then the actual position of the mask can be more accurately obtained, and therefore the mask can be more accurately moved to the preset position by adjusting stretching and displacement of the net stretching module, and the placement position accuracy of the mask relative to the mask frame is improved; and the position information of the mask fixing module is accurately determined through the first displacement measurement module, the fixing accuracy of the mask fixing module to the mask and the mask frame is improved, and therefore the manufacturing accuracy of a metal mask plate is improved.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a mask manufacturing device and a manufacturing method. Background technique [0002] At present, the evaporation method used on all OLED mass production machines is horizontal evaporation, and a mask must be used in the OLED evaporation process. The method of manufacturing the mask plate can be roughly divided into two categories, which are respectively stretching the net in strips and stretching the whole net together. Strip-stretching is to apply a certain tension to the mask strips, and then install the mask strips on the mask frame one by one to form a mask plate. [0003] A high-precision metal mask (Fine Metal Mask, FMM) has been widely used due to its high meshing precision. In the existing FMM manufacturing equipment, due to the limitation of equipment structure and measurement means, the manufacturing accuracy of FMM stays at the level above 2μm-3μm, and it ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04C23C14/24G01B11/00G01B11/25G01S17/08
CPCC23C14/042C23C14/24G01S17/08G01B11/00G01B11/25
Inventor 周畅黄元昊罗闻
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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