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Mask manufacturing device and manufacturing method

A technology for manufacturing devices and masks, which is applied in the direction of measuring devices, optical devices, instruments, etc., can solve the problems of stagnant manufacturing accuracy and difficulty in further improving the manufacturing accuracy of metal masks, so as to improve the fixed accuracy, improve the manufacturing accuracy, Effect of improving positional accuracy

Active Publication Date: 2022-03-15
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the existing FMM production equipment, due to the limitations of the equipment structure and measurement methods, the production accuracy of FMM stays at the level of 2μm-3μm or more, and it is difficult to further improve the production accuracy of the metal mask

Method used

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  • Mask manufacturing device and manufacturing method
  • Mask manufacturing device and manufacturing method
  • Mask manufacturing device and manufacturing method

Examples

Experimental program
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Effect test

Embodiment 2

[0111] An embodiment of the present invention provides a mask manufacturing method, which is based on the mask manufacturing device provided in the above embodiments of the present invention, Figure 5 A flow chart of a mask manufacturing method provided by an embodiment of the present invention, such as Figure 5 As shown, the mask making method includes:

[0112] S101. Establish a reference coordinate system.

[0113] Exemplarily, firstly, a reference plane is selected, which is perpendicular to the Z direction. The reference plane may be the plane where the surface of the base is located, the plane where the surface of the moving table is located, the plane where the surface of the gantry beam is located, etc. The embodiment of the present invention is here There is no limitation, as long as the reference plane is perpendicular to the Z direction. Then, a reference coordinate system is established in the reference plane. For example, the geometric center of the mask frame...

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PUM

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Abstract

The invention discloses a mask making device, which includes: a stretching module for stretching a mask and transferring the mask to a mask frame; a mask detection module for detecting whether the mask strip is Position information on the mask frame; a mask fixing module, used to fix the mask on the mask frame; a first displacement measurement module, used to measure the stretching module and the mask The location information of the fixed module. The position information of the mask detection module is accurately determined by the first displacement measurement module, and the actual position of the mask can be obtained more accurately, so that the mask can be moved to the preset position more accurately by adjusting the tension and displacement of the stretching module position, thereby improving the position accuracy of the mask relative to the mask frame; and accurately determining the position information of the mask fixing module through the first displacement measurement module, improving the fixing accuracy of the mask fixing module to the mask and the mask frame, thereby The manufacturing precision of the metal mask is improved.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a mask manufacturing device and a manufacturing method. Background technique [0002] At present, the evaporation method used on all OLED mass production machines is horizontal evaporation, and a mask must be used in the OLED evaporation process. The method of manufacturing the mask plate can be roughly divided into two categories, which are respectively stretching the net in strips and stretching the whole net together. Strip-stretching is to apply a certain tension to the mask strips, and then install the mask strips on the mask frame one by one to form a mask plate. [0003] A high-precision metal mask (Fine Metal Mask, FMM) has been widely used due to its high meshing precision. In the existing FMM manufacturing equipment, due to the limitation of equipment structure and measurement means, the manufacturing accuracy of FMM stays at the level above 2μm-3μm, and it ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/04C23C14/24G01B11/00G01B11/25G01S17/08
CPCC23C14/042C23C14/24G01S17/08G01B11/00G01B11/25
Inventor 周畅黄元昊罗闻
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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