A kind of preparation method of vanadium-tungsten alloy target blank

A technology of alloy target and vanadium tungsten, which is applied in metal material coating process, vacuum evaporation plating, coating, etc., can solve the problems of complex preparation process and poor density, and achieve the goal of avoiding abnormal discharge and excellent sputtering performance Effect
CN112760538BActive Publication Date: 2022-04-12KONFOONG MATERIALS INTERNATIONAL CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
KONFOONG MATERIALS INTERNATIONAL CO LTD
Publication Date
2022-04-12

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Abstract

The invention relates to a method for preparing a vanadium-tungsten alloy target blank. The vanadium-tungsten alloy target blank includes: 11-19% W in terms of mass percentage, and the balance is vanadium; the preparation method includes the following steps: (1 ) mixing vanadium powder and tungsten powder according to the formula, and then putting them into a mould; (2) putting them into a furnace and evacuating, and then performing hot-press sintering to obtain the vanadium-tungsten alloy target blank. The preparation method provided by the present invention realizes the preparation of a vanadium-tungsten alloy target blank with a density ≥ 98.79% by redesigning the proportion of vanadium and tungsten in the target blank and using a specific sintering process. The target material prepared by using the target blank When sputtering, it has excellent sputtering performance, and abnormal discharge can be avoided during the sputtering process.
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Description

technical field

[0001] The invention relates to the field of target material preparation, in particular to a method for preparing a vanadium-tungsten alloy target blank. Background technique

[0002] In recent years, with the development of domestic infrared detection and other industries, the demand for high-purity vanadium-tungsten targets has increased significantly. At present, the density of domestically produced vanadium-tungsten targets is low, which cannot meet the quality requirements of the high-end electronics industry. Only some of them are used. in low-end products. At present, only a few developed countries and regions in the United States can produce high-purity and high-density vanadium-tungsten targets. Research and development of vanadium-tungsten target production technology is a powerful means to break foreign monopoly and reduce the cost of the microelectronics industry.

[0003] Such as CN104946950A a vanadium-tungsten alloy target and its preparation ...

Claims

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