Manufacturing method of tungsten-titanium target and manufacturing method of tungsten-titanium target combination
A technology of tungsten-titanium target material and manufacturing method, applied in the field of sputtering target material, can solve the problems of unreachable tungsten-titanium target material, high hardness value of tungsten-titanium target material, prone to cracks, etc., and achieves fast production speed and excellent quality. The effect of sputtering performance and productivity improvement
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[0029] The invention discloses a method for manufacturing a tungsten-titanium target material. A mixed powder of tungsten powder and titanium powder is loaded into a mold, and then the mixed powder is subjected to cold-press forming treatment to form a tungsten-titanium target material blank, and then The tungsten-titanium target blank is vacuum hot-pressed and sintered to form a tungsten-titanium target. Wherein, the vacuum hot-press sintering treatment includes: evacuating the vacuum hot-press furnace to an absolute pressure below 100 Pa, raising the temperature to 900-1100°C at a heating rate of 5°C / min-10°C / min, and holding the temperature for 60-90min. Then fill in an inert gas until the relative pressure of the vacuum hot pressing furnace is -0.08MPa~-0.06MPa. Finally, pressurize to the maximum pressure at a pressurization rate of 0.1MPa / min~0.4MPa / min, and raise the temperature to the highest temperature at a heating rate of 5°C / min~10°C / min, and the maximum temperature...
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