A back tube for casting a rotating target and its manufacturing method

A technology of rotating target and back tube, which is used in the improvement of process efficiency, metal material coating process, solid-state diffusion coating, etc., can solve the problem that the content of nickel and aluminum in the target exceeds the standard, the bonding strength is high, and the surface wetting time is long. and other problems, to achieve the effect of less target impurities, small shielding effect and high sputtering power

A technology of rotating target and back tube, which is used in the improvement of process efficiency, metal material coating process, solid-state diffusion coating, etc., can solve the problem that the content of nickel and aluminum in the target exceeds the standard, the bonding strength is high, and the surface wetting time is long. and other problems, to achieve the effect of less target impurities, small shielding effect and high sputtering power

CN112522754BActive Publication Date: 2022-05-31JIANGYIN ENTRET COATING TECH

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  • A back tube for casting a rotating target and its manufacturing method
  • A back tube for casting a rotating target and its manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] A back tube for casting a rotating target, comprising a stainless steel tube 4, the stainless steel tube 4 is plated with a nickel layer 5 outside, the thickness of the nickel layer 5 is 0.005 mm, and the surface roughness of the nickel layer 5 is Ra3.2~Ra6.3, the surface of the nickel layer 5 has a tin infiltration layer. The grade of the stainless steel pipe is 304, 304L, 316 or 316L.

[0028] The production method of the back tube for casting a rotating target, the steps of which are:

[0029] a. Clean the outer surface of the stainless steel tube to remove dust and oil, and then polish the outer surface with P120 abrasive belt to make the outer surface roughness Ra3.2~Ra6.3. In order to improve the grinding efficiency, a sander equipped with a P120 annular abrasive belt can be used for grinding.

[0030] b. Put the stainless steel tube obtained in step a into an electroplating tank for nickel electroplating, so that the outer surface of the stainless steel tube is...

Embodiment 2

[0039] This example is basically the same as Example 1, except that in step f of the production method, the tin infiltration solution is applied to the outer surface of the stainless steel tube obtained in step e and the holding time is 80 minutes. At this time, the tin infiltration time is longer, and the area occupied by the tin layer on the surface of the nickel layer becomes larger, reaching more than 40%, and some parts are even connected into pieces, and the thickness of the tin layer is less than 0.002 mm.

[0040] When the back tube of this embodiment is used for target production, the total amount of nickel and tin infiltrated into the target material accounts for less than 0.009% by weight of the target material. However, due to the large proportion of the tin layer, the wetting time is more than 70% shorter than that of the tin-free layer.

Embodiment 3

[0042] A back tube for casting a rotating target material, comprising a stainless steel tube 4, the outside of the stainless steel tube 4 is electroplated with a nickel layer 5, the thickness of the nickel layer 5 is 0.02 mm, and the surface roughness of the nickel layer 5 is Ra3.2~Ra6.3, the surface of the nickel layer 5 has a tin infiltration layer. The grade of the stainless steel pipe is 304, 304L, 316 or 316L.

[0043] The production method and steps of the back tube used for casting the rotating target in this embodiment are the same as those in Embodiment 1.

[0044] Using the back tube of this embodiment to produce the target, under other conditions being the same, has a higher purity than the back tube of the prior art. In addition, since the thickness of the nickel layer is 0.02 mm, it is still very thin compared with the 0.5 mm nickel-aluminum layer by arc spraying in the prior art, the shielding effect on the magnetic field is small, and the sputtering effect is b...

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Abstract

The invention relates to the technical field of the manufacture of rotating targets, in particular to a back pipe used for casting rotating targets. It includes a stainless steel tube, the outer part of the stainless steel tube is electroplated with a nickel layer, the thickness of the nickel layer is 0.005-0.1 mm, the surface roughness of the nickel layer is Ra3.2-Ra6.3, and the surface of the nickel layer has Tin layer. The production method is as follows: first, the surface of the stainless steel tube is cleaned, then polished, and then electroplated with a nickel layer on its surface, then annealed, then treated with an acid solution, and then treated with a tin infiltration solution. It is cleaned and dried to obtain the back tube for casting the rotating target. The rotating target produced by the back tube of the present invention has less impurities, less shielding effect on the magnetic field, and better sputtering effect.

Description

technical field [0001] The invention relates to the technical field of the manufacture of rotating targets, in particular to a back tube for casting a rotating target and a manufacturing method thereof. Background technique [0002] Compared with the flat target, the rotating target has the advantages of high utilization rate and high sputtering efficiency. The current low melting point rotary targets, such as rotary tin targets, rotary zinc-tin targets, rotary zinc-aluminum targets, and rotary zinc-tin-antimony targets, are generally produced by a casting process. The rotating target material produced by the casting process has the advantages of high density, low oxygen and nitrogen content, good thermal conductivity, etc., and the equipment is simple and the production cost is low. However, tin, zinc tin and other materials have low strength and are easy to deform, so they must be cast on the stainless steel back tube. [0003] The current production principle of rotatin...

Claims

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Application Information

Patent Timeline
31 May 2022
Publication
CN112522754B
IPC
C25D7/04; C25D3/12; C25D5/50; C25D5/48; C23C10/24; C23C14/35
CPC
C25D7/04; C25D3/12; C25D5/50; C25D5/48; C23C10/24; C23C14/3414; C23C14/35; Y02P10/20
Inventors
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