A device and method for removing s impurities in yellow phosphorus by directional solidification through full melting
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- 贵州威顿晶磷电子材料股份有限公司
- Publication Date
- 2021-11-23
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Abstract
Description
technical field
[0001] The invention relates to a device and method for removing S impurities in yellow phosphorus through directional solidification through full melting, and belongs to the technical field of semiconductor materials. Background technique
[0002] Due to the development of the semiconductor industry in recent years, the demand for high-purity yellow phosphorus has increased. High-purity yellow phosphorus is mainly used for the polycrystalline and single crystal growth of indium phosphide (InP) and gallium phosphide (GaP), that is, the synthesis of indium phosphide and gallium phosphide. Indium phosphide and gallium phosphide compound semiconductors require a phosphorus source with a purity of more than 6N, especially for sulfur content control. Therefore, in order to solve the limitation brought by the high sulfur content to the application of high-purity yellow phosphorus, it is imminent to develop low-sulfur yellow phosphorus production technology. Cont...