Rotation measurement and control device of rotation platform
A technology of a rotating platform and a measurement and control device, which is applied in the photolithographic process exposure device, the photographic process of the pattern surface, optics, etc., and can solve the problem of affecting the efficiency of lithography processing, deviation, and the inability to perform more accurate exchange control feedback adjustments, etc. problem, achieve the effect of improving photolithography processing efficiency and reducing time
Pending Publication Date: 2021-05-25
SHANGHAI INTEGRATED CIRCUIT EQUIP & MATERIALS IND INNOVATION CENT CO +1
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Problems solved by technology
[0003] In the prior art, during the exchange process of the workpiece table, the position sensor installed at the corner of the workpiece table for alignment and other purposes is used to align with the station. In order to play a role, and in the process of workpiece table exchange, more accurate exchange control and feedback adjustment cannot be performed, resulting in a large position deviation after the workpiece table exchange is completed, and it takes a long time to calibrate. Seriously affects the photolithography processing efficiency
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[0046] The specific embodiment of the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0047] It should be noted that, in the following specific embodiments, when describing the embodiments of the present invention in detail, in order to clearly show the structure of the present invention for the convenience of description, the structures in the drawings are not drawn according to the general scale, and are drawn Partial magnification, deformation and simplification are included, therefore, it should be avoided to be interpreted as a limitation of the present invention.
[0048] In the following specific embodiments of the present invention, please refer to figure 1 , figure 1 It is a schematic structural diagram of a photolithography device in a preferred embodiment of the present invention. Such as figure 1As shown, a kind of lithography apparatus of the present invention adopts the framework design of double wor...
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The invention discloses a rotation measurement and control device of a rotation platform, which comprises a rotation platform, a magnetic suspension plane rotation motor and a cylindrical grating interferometer, and is characterized in that the cylindrical grating interferometer comprises a cylindrical grating ruler, a plurality of grating ruler reading heads and a plane interferometer located at the bottom of the cylindrical grating ruler; the cylindrical grating interferometer is used for measuring the rotating angle of the rotating platform, the offset in the horizontal direction and the vertical direction and the inclination amount in the vertical direction; and the magnetic suspension plane rotation motor controls the rotation of the rotating platform according to the measurement result of the cylindrical grating interferometer, and compensates the offset in the horizontal direction and the vertical direction and the inclination in the vertical direction. According to the invention, the magnetic suspension plane rotation motor is adopted to rotate and drive the rotating platform for bearing the workpiece table, and the cylindrical grating interferometer is used to measure the rotating angle and offset in real time and perform feedback compensation and control, so that the rotating platform can accurately exchange the workpiece table to a corresponding station.
Description
technical field [0001] The invention relates to the technical field of lithography equipment for integrated circuit manufacturing, in particular to a rotation measurement and control device for a rotation platform. Background technique [0002] In order to improve the efficiency of photolithography processing, two workpiece tables are set up on the photolithography machine corresponding to the measurement station and the exposure station. Silicon wafers are respectively placed on each workpiece station, and the measurement and exposure processes of silicon wafers are performed simultaneously. Among them, coordinate alignment and leveling are performed on the silicon wafer on the measuring station, and alignment and exposure are performed on the silicon wafer reticle on the exposure station. Then, the positions of the two workpiece tables are exchanged, and the silicon wafers processed by the measurement process are exchanged to the exposure station along with the workpiece t...
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Login to View More IPC IPC(8): G03F7/20
CPCG03F7/70491G03F7/70725
Inventor 李艳丽伍强
Owner SHANGHAI INTEGRATED CIRCUIT EQUIP & MATERIALS IND INNOVATION CENT CO