121 results about "Grating interferometer" patented technology

An x-ray CT system for x-ray phase contrast and / or x-ray dark field imaging has a grating interferometer that has a first grating structure that has a number of band-shaped x-ray emission maxima and minima arranged in parallel, the maxima and minima exhibiting a first grating period, a second band-shaped grating structure that produces, as a phase grating, a partial phase offset of x-ray radiation passing therethrough and that exhibits a second grating period, a third band-shaped grating structure with a third grating period with which relative phase shifts of adjacent x-rays and / or their scatter components are detected, and a device for value-based determination of the phase between adjacent x-rays and / or for value-based determination of the spatial intensity curve per detector element perpendicular to the bands of the grating structures. The third grating structure has a grating period that is larger by a factor of 2 to 5 than the grating period of the first grating structure.

The present invention is directed to a heterodyne reflectometer system and method for obtaining highly accurate phase shift information from heterodyned optical signals, from which extremely accurate film depths can be calculated. A linearly polarized light comprised of two linearly polarized components that are orthogonal to each other, with split optical frequencies, is directed toward a film causing one of the optical polarization components to lag behind the other due to an increase in the optical path in the film for that component. A pair of detectors receives the beam reflected from the film layer and produces a measurement signal, and the beam prior to incidence on the film layer and generates a reference signal, respectively. The measurement signal and reference signal are analyzed by a phase detector for phase shift. The detected phase shift is then fed into a thickness calculator for film thickness results. A grating interferometer may be included with the heterodyne reflectometer system with a grating, which diffracts the reflected beam into zeroth- and first-order bands, which are then detected by separate detectors. A detector receives the zeroth-order beam and generates another measurement signal. Another detector receives the first-order beam and generates a grating signal. The measurement signal from the grating and reference signal may be analyzed by a phase detector for phase shift, which is related to the thickness of the film. Conversely, either measurement signal may be analyzed with the grating signal by a phase detector for detecting a grating phase shift. The refractive index for the film may be calculated from grating phase shift and the heterodyne phase shift. The updated refractive index is then used for calculating thickness.