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Colloidal silica and method for producing same

A colloidal silica and silica technology, applied in chemical instruments and methods, inorganic chemistry, silicon compounds, etc., can solve the problem of lack of research on the shape of silica particles, and achieve the effects of excellent compactness and excellent maintenance.

Pending Publication Date: 2021-10-26
FUSO CHEM
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, according to the production method described in Patent Document 1, spherical particles are produced, and the shape of the silica particles has not been studied.

Method used

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  • Colloidal silica and method for producing same

Examples

Experimental program
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Effect test

Embodiment 1

[0131] (Step 1) 6767 g of pure water as a solvent and 6.98 g of 3-ethoxypropylamine (3-EOPA) as a basic catalyst were charged in a flask to prepare a mother liquor. The pH of the mother liquor was 11.0.

[0132] (Step 2) After heating the mother liquor to an internal temperature of 80°C, while adjusting the temperature so that the internal temperature does not change, 2472 g of tetramethylorthosilicate was added dropwise at a constant rate over 210 minutes to the mother liquor to prepare a seed particle dispersion .

[0133] (Step 3) 5704 g of pure water as a solvent, 6.50 g of 3-ethoxypropylamine (3-EOPA) as a basic catalyst, and 1075 g of the seed particle dispersion prepared in Step 2 were placed in a flask. Next, after heating to an internal temperature of 80° C., 2,397 g of tetramethyl orthosilicate was dropped at a constant rate over 180 minutes while adjusting the temperature so that the internal temperature did not vary. Stirring was maintained for 15 minutes after c...

Embodiment 2

[0136] (Step 1) 6,767 g of pure water as a solvent and 10.47 g of 3-ethoxypropylamine (3-EOPA) as a basic catalyst were placed in a flask to prepare a mother liquor. The pH of the mother liquor was 11.3.

[0137] (Step 2) After heating the mother liquid to an internal temperature of 85°C, while adjusting the temperature so that the internal temperature does not change, 2472 g of tetramethyl orthosilicate was added dropwise at a constant rate over 210 minutes to the mother liquid to prepare a seed particle dispersion .

[0138] (Step 3) 5704 g of pure water as a solvent, 6.50 g of 3-ethoxypropylamine (3-EOPA) as a basic catalyst, 242 g of methanol, and 667 g of the seed particle dispersion prepared in Step 2 were placed in a flask. Next, after heating to an internal temperature of 80° C., 2,397 g of tetramethyl orthosilicate was dropped at a constant rate over 180 minutes while adjusting the temperature so that the internal temperature did not vary. Stirring was maintained fo...

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Abstract

The present invention provides: a colloidal silica which contains silica particles that exhibits excellent retainability of surface unevenness under basic conditions, while having excellent compactness; and a production method by which this colloidal silica is able to be produced. The present invention provides a colloidal silica which contains silica particles having surface unevenness, and which is characterized in that: (1) the silica particles have an alkoxy group content of 1,000 ppm or more; and (2) if the silica particles are heated under basic conditions, the decrease rate of the specific surface area is 15.0% or less.

Description

technical field [0001] The present invention relates to colloidal silica and a method for producing the same, and more particularly, to colloidal silica containing silica particles having surface irregularities and a method for producing the same. Background technique [0002] Colloidal silica is formed by dispersing fine particles of silica in a medium such as water. It is not only used as a physical property improver in the fields of paper, fiber, and steel, but also as an abrasive for electronic materials such as semiconductor chips. High purity and compactness are required for silica particles dispersed in colloidal silica used in such applications. [0003] As a method for producing colloidal silica that can meet the above requirements, for example, a method for producing an aqueous silica sol in which an alkyl silicate is added to a reaction medium having an alkali concentration in a specific range is disclosed (for example, refer to Patent Document 1 ). [0004] How...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/141
CPCC01B33/141C01B33/145C01P2004/03C01P2004/64C01P2006/12
Inventor 藤村友香道胁良树
Owner FUSO CHEM