A method for measuring ellipsometric spectrum under packaging conditions

Abstract

The invention discloses a method for measuring ellipsometric spectrum under packaging conditions, measuring detector width δ, beam diameter d, non-accurate refraction index n of packaging layer, incident angle α, taking the larger value max{d of δ and d ,δ}=w, calculate the minimum value of the thickness of the encapsulation layer; measure the ellipsometric spectrum on the upper surface of the encapsulation layer, collect the ratio ρ of the p-polarization component and the s-polarization component of the reflected light from the ellipsometer, and calculate the dielectric function εs of the encapsulation layer ; Measure the refraction angle β of the packaging substrate, calculate the air layer parameter T between the packaging substrate and the measured material and the dielectric function εm of the single-layer bulk material under packaging conditions. The invention does not need to know the dielectric properties of the packaging layer in advance, avoids the difficulty of multi-parameter fitting of the dielectric properties of the packaging layer, completely eliminates the error introduced by the packaging layer, and is suitable for different substrate packaging, vacuum box packaging, liquid Spectral ellipsometry testing under various packaging conditions such as phase packaging has certain universality.

Description

technical field [0001] The invention belongs to the technical field of optical measurement, in particular to an elliptical polarization spectrum measurement technology. Background technique [0002] The interaction between light and matter, especially the interaction mechanism and related measurement of photons and electrons, has been a scientific problem of physical optics for a long time. Surface plasmons generated by the interaction of photons and electrons at material interfaces have attracted attention due to their subwavelength properties and high energy localization. [0003] In recent years, with the improvement of material micro-nano processing and characterization capabilities, metal surface plasmontics have shown broad application prospects in the fields of spectroscopy, metasurfaces, and photocatalysis. Due to the high locality of the electromagnetic field, the metal surface plasmon also exhibits the characteristics of high ohmic loss, making it difficult to be ...

AI Technical Summary

Problems solved by technology

[0005] In-situ measurement of the dielectric function of alkali metals in a high-vacuum chamber, on the one hand, requires a high degree of vacuum in the chamber, on the other hand, it is very complicated to integrate the coating chamber and ellipsometer, and it is difficult to avoid the alkali metal Oxidation

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