The invention belongs to the technical field of
far infrared refractive index detectors, and particularly relates to a
far infrared refractive index detector based on a thin metasurface and a preparation method of the
far infrared refractive index detector. The method comprises the following steps: providing a polar
dielectric substrate and a high-refractive-index material, obtaining
dielectric functions of the polar
dielectric substrate and the high-refractive-index material through an
ellipsometry test, performing full-wave numerical
simulation by taking the obtained parameters as input, constructing a metasurface
physical model, testing transmissivity and complex refractive index of a medium to be tested, and assembling a PMMA micro-channel, the metasurface and the medium to be tested into an integrated device to carry out joint test. And finally, the
reflection spectrum of the
assembly device in the far
infrared band is obtained through an
ellipsometry test. According to the invention, through a novel material model and model optimization, comprehensive performances of insensitivity of an incidence angle of a far
infrared band, high narrow-band absorption, strong near field and high
penetration depth are realized; therefore, the problems of strong incidence
angle dependence, insensitivity to volume
phase response, easy surface
pollution / adsorption interference, high device size and complexity, low detection efficiency and the like in the traditional technology are effectively solved.