The invention discloses a polarized light sensitive long-wave infrared sub-wavelength grating MDM trapezoidal structure absorber. The structure absorber comprises a zinc sulfide substrate, wherein the bottom of the substrate is plated with an aluminum film, and an upper portion of the substrate is plated with a trapezoidal grating structure layer sequentially comprising an aluminum film, a zinc selenide film, an aluminum film, a germanium film and an aluminum film from bottom to top. According to the structure absorber, a processing technology combining photoetching, etching and film coating is adopted, translation regulation and control of the central wavelength of an absorption peak can be realized only by changing the duty ratio or period of the micro-nano structure, ultra-wide-angle narrow-band high absorption is realized under multiple azimuth angles, and simultaneous processing and preparation are realized for the same film layer of multiple groups of strip micro-nano structures in a full array area; problems that in a traditional coating process, due to the fact that coating is conducted for multiple times in a time-division and area-division mode, the order of magnitude of the number of times of coating is increased, and the relative parallelism of dissimilatory coating of multiple strips is difficult to guarantee are solved, machining efficiency is improved, machining and preparing difficulty and complexity of the polarization spectrum light splitting device in the full-array area are reduced, and innovative significance is achieved.