8 results about "Sum-frequency generation" patented technology

A laser assembly and a method for generating continuous-wave (CW) light at approximately 193 nm (between 180 nm and 200 nm) and at a power of 1W or higher using two CW laser sources: one laser source generating first fundamental light that is twice frequency doubled or otherwise converted into first CW light having a first deep-ultraviolet (DUV) wavelength between 250 nm and 275 nm, the other laser source generating second CW light having an infrared (IR) wavelength between 1300 nm and 1700 nm. A resonant cavity receives the second CW light and generates enhanced CW light at 100 W or higher. A first non-linear optical (NLO) crystal mixes a first enhanced CW light portion and the first CW light to generate sum-frequency generation (SFG) light having a second DUV wavelength. A second NLO crystal mixes a second enhanced CW light portion and the SFG light to generate output CW light at approximately 193 nm.

This invention relates to a laser generating device with a wavelength of 215-222 nm, comprising: an excitation light source unit that converts laser light with a wavelength of 1030-1064 nm into a second harmonic to generate laser light with a wavelength of 515-532 nm; an optical parametric oscillation unit that uses the laser light with a wavelength of 515-532 nm as excitation light to generate signal light with a wavelength of 858-887 nm and idle light with a wavelength of 1288-1330 nm; a separation unit that separates the signal light and the idle light; a first wavelength conversion unit that generates a fourth harmonic from the signal light; a second wavelength conversion unit that generates deep ultraviolet light with a wavelength of 215-222 nm from the idle light by light summing with the second harmonic of the excitation light; and a coupling unit that couples the fourth harmonic from the first wavelength conversion unit with the deep ultraviolet light from the second wavelength conversion unit. This invention provides a laser generating device capable of efficiently and simply generating pulsed laser light with a wavelength of 215-222 nm, including a wavelength of 222 nm that inactivates microorganisms.

A laser apparatus for generating a sub- 190 nanometer laser beam includes a deep-ultraviolet solid-state laser source to generate an initial deep-ultraviolet laser beam, at least one mid-infrared solid-state laser source to generate at least one respective mid-infrared laser beam, and at least one lithium triborate crystal to generate an output deep-ultraviolet laser beam from the initial deep-ultraviolet and mid-infrared laser beams via sum-frequency generation. Each mid-infrared solid- state laser source includes (a) a holmium-, thulium-, or chromium-doped gain crystal or gain fiber or (b) an optically-pumped semiconductor gain material to generate the respective mid-infrared laser beam. The laser apparatus may be configured for continuous-wave and pulsed operation, thus offering versatile solutions for applications requiring DUV laser radiation below 190 nanometers. Advantageously, the present approach relies on lithium triborate. Lithium triborate crystals can be grown with the quality and dimensions needed for industrial applications.

The embodiment of the invention provides a frequency conversion device based on a lithium niobate ridge waveguide on an insulator and a preparation method, and belongs to the field of integrated optical, nonlinear optical and optoelectronic devices. The device comprises a silicon substrate layer, a silicon dioxide buffer layer, an x-cut lithium niobate film layer and a silicon dioxide cladding from bottom to top, a ridge waveguide with width periodically changing is arranged on the x-cut lithium niobate layer, and light in the waveguide is propagated in the y-axis direction. The waveguide with the width periodically changing is prepared on the lithium niobate film, quasi-phase matching is achieved, and therefore the second harmonic conversion efficiency is greatly improved. By changing the period of the waveguide, second-order nonlinear phase matching conditions under different wavelengths, such as phase matching conditions of second harmonic generation, sum frequency generation and difference frequency generation, can be met. Correspondingly, according to the preparation method, the waveguide structure with the periodically changed width can be formed through a single etching process, and a complex ferroelectric domain inversion step is not needed. The preparation method has the advantages of simple process, controllable morphology and flexible design.

The invention discloses an all-solid-state deep ultraviolet light source, and relates to the technical field of solid laser, and the deep ultraviolet light source comprises a fundamental frequency optical module, a frequency tripling module, a frequency doubling module, a titanium sapphire laser module and a sum frequency module. The fundamental frequency optical module generates two pieces of 1064.4 nm near-infrared laser with the same repetition frequency; the third harmonic generation module is used for performing third harmonic generation on the first 1064.4 nm near-infrared laser to generate 354.8 nm ultraviolet light; the frequency doubling module carries out frequency doubling on the second 1064.4 nm near-infrared laser to generate 532.2 nm green light; the titanium sapphire laser module adopts a frequency doubling module to output green light pumping, and generates 823.9 nm near-infrared laser; the sum frequency module carries out sum frequency on 354.8 nm ultraviolet light and 823.9 nm near infrared light which are generated by the frequency tripling module and the titanium sapphire laser module to generate 248.3 nm deep ultraviolet light, and the production cost of the 248.3 nm deep ultraviolet light source can be effectively reduced.

The invention belongs to the technical field of lasers, and provides a 486nm laser based on Raman laser frequency tripling and application, the 486nm laser is used for outputting 486.1 nm target blue light, and the 486nm laser comprises a fundamental frequency light source, a frequency tripling module and a dichroscope; the base frequency light source outputs base frequency light of 1458.3 nm, frequency doubling is carried out on the base frequency light of 1458.3 nm with a part of power in the frequency doubling crystal to generate frequency doubling light of 729.15 nm, and sum frequency is carried out on the base frequency light of 1458.3 nm with the other part of power and the frequency doubling light of 729.15 nm in the sum frequency crystal to generate target blue light of 486.1 nm; and 486.1 nm target blue light is separated and output by using a dichroscope. The blue light source with high power, high light beam quality, high stability and narrow linewidth can be realized, and a high-performance light source is provided for underwater application scenes such as underwater detection, communication, photoelectric countermeasure and diving exploration.

A laser assembly and a method for generating continuous-wave (CW) light at approximately 193 nm (between 180 nm and 200 nm) and at a power of 1 W or higher using two CW laser sources: one laser source generating first fundamental light that is twice frequency doubled or otherwise converted into first CW light having a first deep-ultraviolet (DUV) wavelength between 250 nm and 275 nm, the other laser source generating second CW light having an infrared (IR) wavelength between 1300 nm and 1700 nm. A resonant cavity receives the second CW light and generates enhanced CW light at 100 W or higher. A first non-linear optical (NLO) crystal mixes a first enhanced CW light portion and the first CW light to generate sum-frequency generation (SFG) light having a second DUV wavelength. A second NLO crystal mixes a second enhanced CW light portion and the SFG light to generate output CW light at approximately 193 nm.

Aspects of the present disclosure generally relate to two-dimensional electronic apparatuses and methods of use. A two-dimensional electronic sum frequency generation (2D-ESFG) apparatus includes an amplifier including a laser source. A broadband optical parametric amplifier (BOPA) is optically coupled to the amplifier. The BOPA includes a two-stage amplifier. An etalon is optically coupled to the amplifier. The etalon includes two or more partially reflective substrate optical flats. A noncollinear optical parametric amplifier (NOPA) is optically coupled to the amplifier. A dispersive filter pulse shaper is optically coupled to the NOPA. A synchronizer including a galvanometer mirror is optically coupled to the BOPA, the etalon, and the dispersive filter pulse shaper. A detector is optically coupled to the synchronizer.