Method for measuring elliptical polarization spectrum under packaging condition

A technology of ellipsometry and conditions, which is applied in the field of optical measurement, and can solve the problems of high chamber vacuum, complicated integration of coating chamber and ellipsometer, and difficulty in avoiding alkali metal oxidation.

Active Publication Date: 2021-11-16
NANJING UNIV
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Problems solved by technology

[0005] In-situ measurement of the dielectric function of alkali metals in a high-vacuum chamber, on the one hand, requires a high degree of vacuum in the ch

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  • Method for measuring elliptical polarization spectrum under packaging condition
  • Method for measuring elliptical polarization spectrum under packaging condition

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Embodiment Construction

[0016] The technical solution of the present invention will be specifically described below in conjunction with the accompanying drawings.

[0017] The trajectory of the test light passing through the encapsulation layer is as follows: figure 1 As shown, measure the detector width δ, the beam diameter d, the imprecise refractive index n of the encapsulation layer, and the incident angle α, and take the larger value of δ and d max{d,δ}=w, and formula 1 Calculate the minimum value of the encapsulation layer thickness.

[0018] Measure the ellipsometric spectrum on the upper surface of the packaging layer, collect the ratio ρ of the p-polarized component of the reflected light to the s-polarized component from the ellipsometer, and formula 2 Calculate the dielectric function εs of the encapsulation layer.

[0019] Calculate the refraction angle β of the package substrate, from the formula three Calculate the parameter T of the package substrate.

[0020] by formula four ...

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Abstract

The invention discloses a method for measuring an elliptical polarization spectrum under a packaging condition, which comprises the following steps of measuring the width delta of a detector, the diameter d of a light beam, the imprecise refractive index n of a packaging layer and an incident angle alpha, taking the larger value max {d, delta} of delta and d as w, and calculating the minimum value of the thickness of the packaging layer; measuring an elliptical polarization spectrum of the upper surface of the packaging layer, collecting a ratio rho of a p polarization component to an s polarization component of the reflected light from an ellipsometer, and calculating a dielectric function epsilons of the packaging layer; and measuring a refraction angle beta of the packaging substrate, and calculating an air layer parameter T between the packaging substrate and the measured material and a dielectric function epsilon m of a single-layer bulk phase material under a packaging condition. According to the method, the dielectric property of the packaging layer does not need to be known in advance, the difficulty of carrying out multi-parameter fitting on the dielectric property of the packaging layer is avoided, errors introduced by the packaging layer are completely eliminated, and the method is suitable for elliptical polarization spectrum testing under various packaging conditions such as different substrate packaging, vacuum box packaging and liquid phase packaging and has certain universality.

Description

technical field [0001] The invention belongs to the technical field of optical measurement, and in particular relates to an ellipsometric measurement technology. Background technique [0002] The interaction between light and matter, especially the interaction mechanism and related measurement of photons and electrons, has been a scientific issue of physical optics for a long time. Surface plasmons generated by the interaction of photons and electrons at the material interface have attracted attention for their subwavelength properties and high energy localization. [0003] In recent years, with the improvement of material micro-nano processing and characterization capabilities, metal surface plasmonics has shown broad application prospects in the fields of spectroscopy, metasurfaces, and photocatalysis. Due to the high locality of the electromagnetic field, the metal surface plasmon exhibits the characteristics of high ohmic loss, making it difficult to be truly applied in...

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Application Information

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IPC IPC(8): G01N21/21
CPCG01N21/211
Inventor 周林傅涵堉陈舒颖陈鑫杰朱嘉
Owner NANJING UNIV
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