Method for measuring elliptical polarization spectrum under packaging condition

Abstract

The invention discloses a method for measuring an elliptical polarization spectrum under a packaging condition, which comprises the following steps of measuring the width delta of a detector, the diameter d of a light beam, the imprecise refractive index n of a packaging layer and an incident angle alpha, taking the larger value max {d, delta} of delta and d as w, and calculating the minimum value of the thickness of the packaging layer; measuring an elliptical polarization spectrum of the upper surface of the packaging layer, collecting a ratio rho of a p polarization component to an s polarization component of the reflected light from an ellipsometer, and calculating a dielectric function epsilons of the packaging layer; and measuring a refraction angle beta of the packaging substrate, and calculating an air layer parameter T between the packaging substrate and the measured material and a dielectric function epsilon m of a single-layer bulk phase material under a packaging condition. According to the method, the dielectric property of the packaging layer does not need to be known in advance, the difficulty of carrying out multi-parameter fitting on the dielectric property of the packaging layer is avoided, errors introduced by the packaging layer are completely eliminated, and the method is suitable for elliptical polarization spectrum testing under various packaging conditions such as different substrate packaging, vacuum box packaging and liquid phase packaging and has certain universality.

Description

technical field [0001] The invention belongs to the technical field of optical measurement, and in particular relates to an ellipsometric measurement technology. Background technique [0002] The interaction between light and matter, especially the interaction mechanism and related measurement of photons and electrons, has been a scientific issue of physical optics for a long time. Surface plasmons generated by the interaction of photons and electrons at the material interface have attracted attention for their subwavelength properties and high energy localization. [0003] In recent years, with the improvement of material micro-nano processing and characterization capabilities, metal surface plasmonics has shown broad application prospects in the fields of spectroscopy, metasurfaces, and photocatalysis. Due to the high locality of the electromagnetic field, the metal surface plasmon exhibits the characteristics of high ohmic loss, making it difficult to be truly applied in...

AI Technical Summary

Problems solved by technology

[0005] In-situ measurement of the dielectric function of alkali metals in a high-vacuum chamber, on the one hand, requires a high degree of vacuum in the chamber, on the other hand, it is very complicated to integrate the coating chamber and ellipsometer, and it is difficult to avoid the alkali metal Oxidation

Images