Bi-component polyurea elastic material and application thereof
An elastic material, two-component technology, applied in the field of coatings, to achieve excellent flexibility and self-healing ability, improve the effect of stone chip resistance and corrosion resistance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0043] The present embodiment relates to a kind of two-component polyurea elastic material (varnish), and its composition and quality consumption are as follows table 1:
[0044] Table 1
[0045]
[0046] Remark: 1 It is a self-synthetic resin synthesized according to the aforementioned method herein, with an amine equivalent of 280 g / mol.
[0047] 2,3 Purchased from Sinopharm
[0048]4 Evonik Hydrophobically Modified Fumed Silica
[0049] 5 Covestro's IPDI, NCO content 11.9%, NCO equivalent 353g / mol
[0050] 6,7 Purchased from Sinopec Shell
[0051] The performance test results are shown in Tables 2 and 3 below:
[0052] Table 2
[0053]
[0054] 1,2 The stone impact resistance is considered to be very good.
[0055] table 3
[0056]
[0057]
Embodiment 2
[0059] This embodiment relates to a two-component polyurea elastic material, and its composition and mass dosage are as follows in Table 4:
[0060] Table 4
[0061]
[0062] 1 Neuberger silica (kaolin) from HOFFMANN MINERAL, D50 2um
[0063] 2 Chemours Titanium Dioxide
[0064] 3 Other raw materials are the same as Table 1
PUM
Property | Measurement | Unit |
---|---|---|
Amine equivalent | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
![application no application](https://static-eureka.patsnap.com/ssr/23.2.0/_nuxt/application.06fe782c.png)
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com