Exposure machine based on CCD alignment system
An exposure machine and substrate technology, which is applied in the field of exposure machines, can solve problems such as low exposure efficiency, poor exposure products, and the need for repeated exposures, and achieve the effects of improving alignment accuracy, improving quality, and increasing the horizontal scanning range
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[0035] The preferred embodiments of the present invention will be described below in conjunction with the accompanying drawings. It should be understood that the preferred embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.
[0036] Refer to attached Figure 1-8 , an exposure machine based on a CCD alignment system provided by the present invention includes an adjustment device 100 and an execution device 200, the adjustment device 100 is located inside the execution device 200, and the adjustment device 100 includes a substrate 130: it also includes: an adjustment device located on the upper part of the substrate 130 component 110;
[0037]The adjustment assembly 110 includes a first frame 111, two sets of electromagnet devices 112 are arranged on the upper surface of both sides of the first frame 111, the first frame 111 supports the electromagnet device 112, and both ends of the botto...
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