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Mask pattern optimization design method for manufacturing curved surface embossment contour device

A contour and relief technology, applied in computer-aided design, instrumentation, calculation, etc., can solve problems that are difficult to achieve

Active Publication Date: 2022-04-08
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But if you want to make continuously changing relief contours, such as prisms, blazed gratings, Fresnel lenses, micro-lens arrays and other micro-optical elements, it is difficult to achieve using conventional masks

Method used

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  • Mask pattern optimization design method for manufacturing curved surface embossment contour device
  • Mask pattern optimization design method for manufacturing curved surface embossment contour device
  • Mask pattern optimization design method for manufacturing curved surface embossment contour device

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Embodiment Construction

[0021] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0022] The present invention is based on the photoresist exposure model, the development model and the computer simulation method of the development profile to establish the relationship between the exposure amount and the development profile, and then use the iterative optimization algorithm to optimize the design to obtain the exposure amount distribution, and calculate the mask opening shape according to the mask moving exposure principle distributed.

[0023] The present invention relates to a method for optimizing the design of a mask plate pattern for making curved surface relief profile devices. Using the method to optimize the design of the mask comprises the following steps:

[0024] Step (1), establish a photoresist exposure model, and describe the light intensity distribution and photosensitivity of each point inside the photoresist ...

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Abstract

The invention discloses a mask pattern optimization design method for manufacturing a curved relief contour device, which comprises the following steps of: establishing a response model of photosensitive mixture (PAC) concentration distribution of photoresist to exposure light intensity according to the relationship between the exposure light intensity distribution and parameters such as absorption coefficients and photosensitive coefficients of different components of the photoresist; establishing a photoresist development model according to parameters such as the development rate of complete exposure of the photoresist, the development rate of unexposed photoresist, the threshold value of the relative concentration of the photosensitive substance, the development selection constant and the like; the method comprises the following steps: calculating PAC concentration distribution and development rate distribution of each point of photoresist in a layering manner, and establishing a simulation process from exposure to an actual development pattern contour by combining a micro cell removal method; establishing a relation between a binary mask opening function and exposure according to a mask moving exposure principle; and performing optimization design through an iterative optimization algorithm to obtain a mask pattern required for manufacturing the curved surface embossment contour device.

Description

technical field [0001] The invention relates to the technical field of manufacturing curved surface relief profile devices in the fields of integrated circuits, flat panel displays, micro-electromechanical systems, micro-optics, etc., and in particular to a mask pattern optimization design method for manufacturing curved surface relief profile devices. Background technique [0002] The mask plate is the graphic master used in the photolithography process commonly used in micro-nano processing technology. The mask graphic structure is formed on the transparent substrate by an opaque light-shielding film, and then the graphic information is transferred by step-by-step repetition or step-by-step scanning exposure. onto the product substrate. The mask plate is the graphic "negative" in the chip manufacturing process, which is used to transfer high-precision circuit design and carries intellectual property information such as graphic design and process technology. The mask plate...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F30/392
Inventor 刘志祥徐富超贾辛谢强
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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