Ion etching linear fine adjustment mechanism and manufacturing method thereof

Abstract

The invention discloses an ion etching linear fine tuning mechanism and a manufacturing method thereof, the mechanism comprises a base, an adjusting motor, an adjusting screw rod and an adjusting block, the adjusting motor is fixed on the base, the adjusting motor is connected with the adjusting screw rod, the adjusting block is located on the adjusting screw rod, one side of the adjusting block is connected with a guide sliding block, the guide sliding block is provided with a first T-shaped groove, and the first T-shaped groove is provided with a second T-shaped groove. A guide plate is connected into the first T-shaped groove in a penetrating mode, and the guide sliding block and the guide plate are fixed in a limiting mode through a set screw. The method comprises the following steps: (1) part processing; (2) welding and fixing; and (3) assembling the components. The fine adjustment mechanism is reasonable in structural design and high in practicability, accurate adjustment in the linear direction is achieved through the fine adjustment mechanism, use and operation are convenient and automatic, the fine adjustment distance is accurately controlled and adjusted, the structural stability after moving and adjusting in place is ensured, and errors of the moving distance caused by misoperation after adjusting and positioning are effectively prevented.

Description

technical field [0001] The invention relates to the field of fine-tuning technology, in particular to an ion-etching linear fine-tuning mechanism and a manufacturing method thereof. Background technique [0002] Ion beam etching, also known as ion milling, means that when directional high-energy ions hit a solid target, energy is transferred from incident ions to solid surface atoms. If the binding energy between solid surface atoms is lower than the energy of incident ions, solid surface atoms will be removed or removed from the surface. Usually the ions used in ion beam etching come from inert gases. In the use of the ion etching machine, the adjustment of the position is generally realized through the fine-tuning structure, and the adjustment accuracy of the existing fine-tuning structure is average, and errors are prone to occur. Contents of the invention [0003] The purpose of the present invention is to provide an ion-etching linear fine-tuning mechanism and its m...

AI Technical Summary

Problems solved by technology

In the use of ion etching machines, the adjustment of the position is generally realized through the fine-tuning structure. The adjustment accuracy of the existing fine-tuning structure is average, and errors are prone to occur.

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