Optical display device manufacturing method based on array substrate structure

Abstract

The invention provides a manufacturing method of an optical display device based on an array substrate structure, and belongs to the technical field of optical display semiconductors. According to the method, first pixel electrodes and second pixel electrodes which are arranged on the same layer are manufactured asynchronously, on the basis that the first pixel electrodes are distributed on an organic flat layer in a rectangular array mode, through isolation of a passivation layer, in the process that a second deposition layer is manufactured to form the second pixel electrodes through deposition and etching, the first pixel electrodes and the second pixel electrodes are distributed on the organic flat layer in a rectangular array mode. The gap value between the second pixel electrode and the adjacent first pixel electrode can be effectively controlled to be within the preset value, so that the problem that when the first pixel electrode and the second pixel electrode which are located on the same layer are manufactured synchronously in the prior art, the first pixel electrode and the second pixel electrode cannot be manufactured synchronously is solved. And the aperture ratio of the pixel electrode is effectively improved, stray light generated by high-order diffraction is reduced, and the phase modulation performance of the optical display device is improved.

Description

technical field [0001] The invention belongs to the technical field of optical display semiconductor devices, and in particular relates to a manufacturing method of an optical display device based on an array substrate structure. Background technique [0002] The optical phase control display element can effectively increase the pixel transmittance by increasing the pixel aperture ratio, liquid crystal transmission efficiency, polarizer transmittance, and color filter transmittance; among them, the pixel aperture ratio refers to the light transmission or reflection ratio , that is, the effective area of ​​each pixel that can transmit or reflect light is divided by the total area of ​​the pixel. The higher the pixel aperture ratio index, the higher the transmittance of the device to the backlight or the reflectivity of the external light source, and the brightness and penetration of the device will be higher. The efficiency is improved, which can effectively improve the worki...

AI Technical Summary

Problems solved by technology

Based on the existing lower substrate manufacturing method, the first pixel electrode and the second pixel electrode on the same layer are manufactured synchronously, and the size of the gap between them is limited by the exposure accuracy and etching process accuracy in the existing manufacturing process. , there is a minimum gap accuracy. For example, the minimum gap of most LCD production lines is about 2um, which leads to the inability to achieve a higher aperture ratio of the pixel electrode, thereby affecting the phase modulation light utilization rate of the device, and the gap between two adjacent pixel electrodes The large partiality will increase the area of ​​the uncontrolled area of ​​the liquid crystal and the disadvantages of stray light caused by high-order diffraction

[0005] Therefore, optimizing the manufacturing method of the lower substrate of the optical display device with the existing structure to solve the disadvantages that the size of the gap is limited by the exposure accuracy and etching accuracy in the existing manufacturing process and cannot be further reduced is an urgent need to be solved. topic

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