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Non-volatile memory device with peripheral on-structure cells

A non-volatile, memory technology, applied in read-only memory, static memory, information storage, etc., can solve the problem of reducing the size of memory devices, the size of vertical memory devices, etc., and achieve the goal of increasing memory capacity. Effect

Pending Publication Date: 2022-04-15
SAMSUNG ELECTRONICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] Although such a vertical structure is adopted, the size reduction of the vertical memory device is limited due to vertical contacts for connecting the memory cell array and peripheral circuits such as page buffers, row decoders, etc.
Although a vertical structure is used to increase integration, there is a limit in size reduction of the memory device due to the use of vertical contacts for connecting the memory cell array and peripheral circuits such as page buffers, row decoders, etc.

Method used

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  • Non-volatile memory device with peripheral on-structure cells
  • Non-volatile memory device with peripheral on-structure cells
  • Non-volatile memory device with peripheral on-structure cells

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Embodiment Construction

[0036]Hereinafter, various example embodiments will be described in detail with reference to the accompanying drawings. Like reference numerals in the drawings may refer to like elements, and description of an element has been omitted to some extent, it being understood that the element is at least similar to a corresponding element described elsewhere in the specification. Also, description of a single element may apply to plural of the same element unless the context of the description or reference to the figures indicates otherwise.

[0037] In the present disclosure, the vertical direction D3 indicates a direction perpendicular to the upper surface of the semiconductor substrate, and the first and second horizontal directions D1 and D2 indicate two directions parallel to the upper surface of the semiconductor substrate. The first horizontal direction D1 and the second horizontal direction D2 may be substantially vertical. The first horizontal direction D1 may be called a ...

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Abstract

A non-volatile memory device having a cell-on-periphery (COP) structure includes a first sub-memory plane and a second sub-memory plane disposed adjacent to the first sub-memory plane in a row direction. A first vertical contact region is disposed in a cell region of the first sub-memory plane and a second vertical contact region is disposed in a cell region of the second sub-memory plane. A first overhead region is disposed in the cell region of the first sub-memory plane and adjacent to the second vertical contact region in the row direction, and a second overhead region is disposed in the cell region of the second sub-memory plane and adjacent to the first vertical contact region in the row direction. A cell channel structure is disposed in a main region of the cell region.

Description

[0001] Cross References to Related Applications [0002] This application claims priority to Korean Patent Application No. 10-2020-0132567 filed with the Korean Intellectual Property Office (KIPO) on October 14, 2020, the disclosure of which is incorporated herein by reference in its entirety. technical field [0003] The inventive concept generally relates to a semiconductor integrated circuit, and more particularly, to a nonvolatile memory device having a cell on peripheral (COP) structure. Background technique [0004] Recently, memory devices with large memory capacity, smaller size, and higher integration are required. A vertical memory device or a three-dimensional memory device may include a plurality of vertically stacked memory cells to achieve a high degree of integration. In a vertical memory device, a channel may protrude or vertically extend from a surface of a substrate, and gate lines and insulating layers surrounding the vertical channel may be repeatedly st...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/11582H01L27/11573
CPCG11C16/0483G11C5/025G11C16/24G11C16/30G11C5/147H10B43/35H10B43/10H10B43/40H10B43/27H01L25/0657H01L21/76877H01L24/05G11C16/10G11C16/26H10B43/50H01L22/34H01L23/535H10B41/27H10B41/41
Inventor 俞昌渊郭判硕
Owner SAMSUNG ELECTRONICS CO LTD