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Coating device and loading mechanism

A technology of carrier and blocking mechanism, applied in gaseous chemical plating, coating, metal material coating process, etc., can solve problems such as poor coating uniformity, achieve uniform distribution of gas velocity changes, improve flow field distribution, The effect of improving the uniformity of the coating

Pending Publication Date: 2022-04-29
JIANGSU MICROVIA NANO EQUIP TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the coating uniformity of the coating equipment used for amorphous silicon thin film deposition in the prior art is not good

Method used

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  • Coating device and loading mechanism
  • Coating device and loading mechanism
  • Coating device and loading mechanism

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Experimental program
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Embodiment Construction

[0038] The following will clearly and completely describe the technical solutions in the embodiments of the present application with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of this application.

[0039] It should be noted that when an element is referred to as being “disposed on” another element, it may be directly on the other element or there may be another element in between. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or it may be present intervening with the other element. The terms "vertical," "horizontal," "left," "right," and similar expressions are used ...

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PUM

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Abstract

The invention discloses a coating device and an object carrying mechanism, and the object carrying mechanism comprises a carrier plate which comprises a bearing surface for placing a product to be coated; the blocking mechanism is located on the peripheral side of the carrier plate, and a gap is formed between the blocking mechanism and the carrier plate; the gap has a preset depth in the direction perpendicular to the bearing surface; the gap has a preset width in the direction parallel to the bearing surface; the adjusting assembly is located in the gap and used for adjusting the preset depth and / or the preset width of the gap; the adjusting assembly is connected with the carrier plate and / or the blocking mechanism. According to the coating device and the loading mechanism provided by the embodiment of the invention, the flow field distribution in the reaction cavity of the coating device can be improved, so that the coating uniformity is improved.

Description

technical field [0001] This application relates to the technical field of special equipment for the photovoltaic / electronic industry, in particular to a coating device and a loading mechanism. Background technique [0002] The descriptions in this section only provide background information related to the disclosure in this specification and may not constitute prior art. [0003] Heterojunction is a special PN junction, which is formed of amorphous silicon and crystalline silicon materials. It is an amorphous silicon thin film deposited on crystalline silicon, which is a kind of N-type battery. The process flow of the heterojunction cell is less than the current mainstream PERC (PassivatedEmitter and Rear Cell, emitter passivation and back electrode) and TOPCON (Tunnel Oxide Passivated Contact, tunnel oxide layer passivated contact) process flow, only 4 The first step is velvet cleaning, amorphous silicon film deposition, conductive film deposition, and screen printing elec...

Claims

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Application Information

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IPC IPC(8): C23C16/24C23C16/458C23C16/50
CPCC23C16/24C23C16/4583C23C16/50
Inventor 李振陈昊王荣朱双双
Owner JIANGSU MICROVIA NANO EQUIP TECH CO LTD