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Semi-automatic polishing system device for R angle of target material, polishing method and application

A system device, semi-automatic technology, applied in the direction of grinding drive device, grinding/polishing equipment, surface polishing machine tool, etc., can solve the problems of large physical output and limited human output, achieve smooth appearance, save operation time, simplify The effect of craftsmanship

Pending Publication Date: 2022-05-27
武汉江丰电子材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, the existing polishing of the R angle of the target is still in the form of manual sandpaper grinding, the physical output is relatively large, and the human output is limited. Therefore, it is very important to improve the R angle of the target by manual grinding to reduce the manual physical output.

Method used

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  • Semi-automatic polishing system device for R angle of target material, polishing method and application

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Experimental program
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Embodiment 1

[0064] This embodiment provides a semi-automatic polishing system device for the R angle of a target material. The system device includes a base 1, and two polishing units 2 are arranged on the surface of the base 1. The polishing unit 2 includes two polishing components, and the polishing components independently include The main body 4 and the base 3 are rotatably connected, and the main body 4 is respectively provided with a rough polishing wheel 5 and a fine polishing wheel 5 .

[0065] The bottom of the base 3 is provided with gears, and the first chute 6 is provided with a rack. The surface of the body 4 is provided with two fixing grooves, and brackets are respectively arranged in the fixing grooves, and the brackets are respectively connected with the rough polishing wheel 5 and the fine polishing wheel 5, both of which are grinding wheels.

[0066] The polishing unit 2 includes a drive assembly, the drive assembly includes a first motor 9 and a second motor 10 , the f...

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Abstract

The invention provides a semi-automatic target R-angle polishing system device, a polishing method and application, the system device comprises a base, at least one polishing unit is arranged on the surface of the base, each polishing unit comprises at least two polishing assemblies, at least one first sliding groove is formed in the surface of the base, and at least one second sliding groove is formed in the surface of the base. The polishing assembly moves in the first sliding groove and comprises a body and a base which are rotationally connected, and at least two polishing wheels are arranged on the body. According to the device, oxides on the side edge of the target material can be effectively removed, the working efficiency is improved, the labor output of workers is reduced, the working time is saved, and semi-automation of R-angle polishing of the aluminum target material is achieved.

Description

technical field [0001] The invention belongs to the technical field of magnetron sputtering coating, relates to target material polishing, in particular to a target material R-angle semi-automatic polishing system device, a polishing method and application. Background technique [0002] Sputtering targets are used for magnetron sputtering coating, which is a new type of physical vapor deposition (PVD) method. An orthogonal magnetic field and electric field are added between the sputtered target (cathode) and the anode, and the required inert gas (usually Ar gas) is filled in the high vacuum chamber. Under the action of the electric field, the Ar gas is ionized into positive Ions and electrons, a certain negative high pressure is applied to the target, the electrons emitted from the target are affected by the magnetic field and the probability of ionization of the working gas increases, and a high-density plasma is formed near the cathode. Ar ions are affected by the Lorentz ...

Claims

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Application Information

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IPC IPC(8): B24B27/00B24B27/033B24B29/02B24B41/02B24B47/12B24B47/22
CPCB24B27/033B24B29/02B24B27/0076B24B47/22B24B47/12B24B41/02
Inventor 姚力军潘杰王学泽张晓驰范文新周伟君
Owner 武汉江丰电子材料有限公司