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Perovskite film rhythmic deposition production method and equipment

A production equipment and production method technology, applied in the field of perovskite film rhythmic deposition production method and equipment, can solve problems such as lattice distortion, overgrowth stoichiometric ratio, abnormality, etc., and achieve improved reaction speed and high reliability with reproducible effects

Pending Publication Date: 2022-06-03
HANGZHOU MICROQUANTA SEMICON CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The uniform lateral growth of perovskite crystals has intermittent characteristics, and continuous deposition of corresponding materials will lead to excessive growth or abnormal stoichiometric ratio, which does not meet the requirements of perovskite ABX 3 The stoichiometric ratio of similar materials causes problems such as lattice distortion and deformation, so rhythmic control of the deposition process is required

Method used

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  • Perovskite film rhythmic deposition production method and equipment
  • Perovskite film rhythmic deposition production method and equipment
  • Perovskite film rhythmic deposition production method and equipment

Examples

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Embodiment 1

Please continue to refer to the attached figure 2 As shown in the figure, the first perovskite film rhythm deposition production equipment disclosed in the present invention is composed of a sample injection chamber 1, a heating chamber 2, a deposition reaction chamber 3 and a sample output chamber 4, wherein the sample injection chamber 1 is similar to Due to the effect of the transition chamber, the substrate 5 to be deposited enters the low pressure chamber from the atmospheric pressure outside the chamber, and the heating chamber 2 is communicated with the deposition reaction chamber 3, and the temperature of the chamber is higher than that of the deposition reaction chamber 3, so that the substrate 5 to be deposited can be rapidly heated up. to the reaction temperature, and then enter the deposition reaction chamber 3 for reaction. The transport of the substrate 5 to be deposited is realized by a roller 6 driven by a servo motor, and the deposition surface of the substrat...

Embodiment 2

Please refer to the attached Figure 4 As shown, this embodiment is a rhythmic production method in which the length of the reaction section is constant and the length of the deposition section is gradually reduced, derived from the most basic perovskite thin film rhythmic deposition production equipment in Example 1. Taking the combination of three evaporation sources in the first deposition section as an example (there will be more in actual production), the basic process of using the perovskite film rhythmic deposition production equipment of this embodiment to prepare a perovskite film includes the following steps:

Step 21: Filling the chamber 3 of the deposition reaction chamber with nitrogen to make the pressure in the chamber reach normal pressure, then open the upper cover of the chamber, install the evaporation sources in the first to third evaporation source installation grooves, and combine them into the first deposition section, Then the fourth evaporation source i...

Embodiment 3

Please refer to the attached Figure 5 As shown, this embodiment is a rhythmic production method in which the length of the deposition section is constant and the length of the reaction section is increased, which is derived from the most basic perovskite thin film rhythmic deposition production equipment in Example 1. The basic process of preparing the perovskite thin film using the perovskite thin film rhythmic deposition production equipment of this embodiment includes the following steps:

Step 31. Fill the deposition reaction chamber 3 with nitrogen to make the pressure in the chamber reach normal pressure, then open the upper cover of the chamber, and install the evaporation source in the first evaporation source installation slot as the first deposition section, and then the second evaporation source. The source installation slot was left empty as the first reaction stage, then the evaporation source was installed in the third evaporation source installation slot as the s...

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Abstract

The invention relates to a perovskite thin film rhythmic deposition production method and equipment, and the method comprises the steps: putting a to-be-deposited substrate which is provided with a precursor BX2 thin film containing a perovskite precursor BX2 material in advance into a deposition reaction chamber, carrying out the evaporation deposition of a precursor AX material, and pausing after the deposition lasts for a certain time, a precursor AX material deposited on the surface of a precursor BX2 thin film has enough time to diffuse into the precursor BX2 thin film so as to form perovskite ABX3 crystals, deposition is carried out again after pausing for a period of time, and the deposition and pausing processes are repeated in a repeated and alternate rhythm manner, so that the AX material enters the interior of the BX2 thin film and fully reacts with the BX2 material, and the perovskite ABX3 crystals are formed. And thus, ABX3 perovskite crystals without BX2 material residues or with AX material surplus are obtained, and the rhythmic deposition process is ended until the perovskite ABX3 thin film with the set film thickness is obtained. The invention further discloses equipment using the method. According to the invention, continuous large-area production of the perovskite film is realized, and the method also has the characteristics of high reliability and repeatability.

Description

technical field [0001] The invention belongs to the technical field of preparation of perovskite solar cell components, and particularly relates to a production method and equipment for rhythmic deposition of perovskite thin films. Background technique [0002] The light absorption layer in the perovskite solar cell structure is a film layer formed by organometallic halide perovskite material. The forming process of this film is mainly divided into two categories: solution method and gas phase method. The solution method and equipment are simple, and some progress has been made in large-scale preparation, but due to its extremely high requirements for solution formulation, and the complex crystallization process and difficult control of the solution during the process of converting the solution into a solid film, it is easily affected by the external environment. Influence, resulting in poor repeatability of its process, so further in-depth research is needed to have the pro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L51/48H01L51/42C23C14/24C23C14/12
CPCC23C14/24C23C14/12H10K71/164H10K30/10H10K30/50C23C14/5846H10K85/50C23C14/088C23C14/243C23C14/54
Inventor 不公告发明人
Owner HANGZHOU MICROQUANTA SEMICON CO LTD
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