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Deep dechlorination method and device based on chlorine ion occurrence form in chlorinated tailings

A chlorine ion and tailings technology, applied in the field of chemical industry and metallurgy, can solve the problems of insufficient washing to remove residual chlorine, insufficient extraction of chloride ions, etc.

Active Publication Date: 2022-07-12
SICHUAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, as stated in the patent (CN 106348625 B), even if pre-washed with nitric acid, the residual chlorine cannot be fully washed and removed.
It can be seen that the chlorine ions leached out by nitric acid dissolution are only water-soluble chlorine, and the chloride ions in the chlorination tailings cannot be fully extracted.

Method used

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  • Deep dechlorination method and device based on chlorine ion occurrence form in chlorinated tailings
  • Deep dechlorination method and device based on chlorine ion occurrence form in chlorinated tailings
  • Deep dechlorination method and device based on chlorine ion occurrence form in chlorinated tailings

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Experimental program
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Embodiment

[0052] This embodiment adopts Image 6 As shown in the solid sample dechlorination device, the following steps are performed in sequence:

[0053] (1) Weighing the sample: Weigh two samples of 0.4179 g of chlorinated tailings left in the air, accurate to 0.0001 g;

[0054] (2) Preparation of steam: Take 300 mL of deionized water and put it in a 500 mL distillation bottle, turn on the corresponding electric heating jacket switch, and heat to make the water boil for use;

[0055] (3) Pipette the absorption solution: Pipet 10 mL of sodium hydroxide (c(NaOH)=0.2 mol / L) into a 100 mL conical receiving flask as the absorption solution, add 3 drops of phenolphthalein for use;

[0056] (4) Distillation-absorption: Place the weighed sample in a 250 mL three-necked flask, then slowly add 60 mL of sulfuric acid solution (2+1: 200 mL of concentrated sulfuric acid + 100 mL of water), and put a few ceramic Fragments prevent bumping. Connect the steam distillation for distillation, connec...

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Abstract

The invention discloses a deep dechlorination method and device based on the occurrence form of chloride ions in chlorinated tailings, a concentrated sulfuric acid boiling reaction is adopted to destroy the glass phase structure of the chlorinated tailings and release the chloride ions in the chlorinated tailings, and by means of analysis of distillation residues, it is confirmed that the chloride ions are fully removed. The invention provides the deep dechlorination method for the chlorination slag represented by the chlorination tailings, and the deep dechlorination method can be applied to accurate determination of the chlorine content in the chlorination slag represented by the chlorination tailings, and is suitable for popularization and application.

Description

technical field [0001] The invention belongs to the field of chemical metallurgy, and in particular relates to a deep dechlorination method and device based on the occurrence form of chloride ions in chlorinated tailings. Background technique [0002] The Panzhihua-Xichang area of ​​Sichuan Province is rich in vanadium-titanium-magnetite resources. Since the 1960s, after several generations of research and development, the industrial utilization of the three main elements of vanadium, titanium and iron has basically been realized. However, under the current conditions of beneficiation technology, about 54% of the titanium component enters the iron concentrate, and this part of the titanium component is not reduced in the blast furnace smelting to prepare pig iron, and enters the slag phase to form a titanium-containing The blast furnace slag (hereinafter referred to as titanium-containing blast furnace slag), in which the content of titanium dioxide (TiO2) is 15~25 wt.%. Si...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N31/16G01N23/20091G01N23/20008G01N1/28G01N1/34B09B3/70
CPCG01N31/16G01N23/20091G01N23/20008G01N1/28G01N1/34B09B3/00Y02P10/20
Inventor 岳海荣褚关润马奎宋磊梁斌
Owner SICHUAN UNIV