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427 results about "Industrial utilization" patented technology

Method for improving mixed C4 chemical industry exploitation value

The invention relates to a method for improving the chemical industrial utilization value of mixed C4. The method mainly solves the problem that the chemical industrial utilization value and the comprehensive utilization rate of a byproduct of the mixed C4 of a steam cracking device and the byproduct of the mixed C4 of an FCC device in the prior art are low. The invention solves the problem well by the technical proposal which comprises the steps as follows: 1) a selective hydrogenation technology is adopted to ensure that butadiene and acetylene in the mixed C4 are hydrogenated into monoolefine; 2) a hydroisomerization technology is adopted to ensure that butylene-1which is a product in step 1 is isomerized into butylene-2; 3) the product of step 2 is separated by rectifying technology to obtain a product of isobutene; 4) olefin disproportionation technology is used for disproportionating the butylene-2 in the rest of the mixed C4 in step 3 and ethane to produce propylene; and 5) the remained mixed C4 in step 4 is recycled as a cracking raw material. The invention can be used in the industrial production for increasing the production of the propylene and improving the chemical industrial utilization value of the mixed C4.
Owner:CHINA PETROLEUM & CHEM CORP +1

System and process for the treatment of multiphase residues

A system 100 is described for the treatment of multiphase residues having unlimited content of water, oil and solids to obtain hydrocarbons and other products, said system comprising multiphase residue feed system 10, inert gas system 20 and reduced pressure system 30, tubular reactor 40 provided with three heating zones Z-1, Z-2 and Z-3 with a temperature gradient and transportation helicoid 42 to displace the residue mass throughout the reaction zones, the hydrocarbon products and water being collected in a system 60 of condensers 61, 62 and 63 linked to a system 70 of bubbling vessels 71, 72 and 73, reactor 40 being operated in the sealed mode and being provided with a multiphase residue inlet 43 and exit 44 of solid product. The solid product is collected in a system 50 comprising upper valve 51 and lower valve 52, and intermediate silo 53 and then directed to post-treatment system 90 for activation aiming at industrial utilization. The process using the system 100 of the invention is also described. Multiphase organic residues, petroleum residues, pure or in admixture in any amount, from chemical and pharmaceutical industries, paper and pulp industry, and mining industries can be processed in the inventive system. Besides, it is possible to recover phenols from foundry sands in the system and process described.
Owner:PETROLEO BRASILEIRO SA (PETROBRAS) +1

Two-way wave pre-stack depth migration method through one-way wave operator

ActiveCN105911587AHigh industrial production application valueIncrease credibilitySeismic signal processingMaximum depthFull wave
The invention relates to a two-way wave pre-stack depth migration method through a one-way wave operator. The two-way wave pre-stack depth migration method comprises the following steps that 1. an upper and lower dual detector seismic data acquisition system is adopted so that a detector wave field is formed; 2. seismic wavelet information is extracted so that a seismic source wave field is formed; 3. single-shot seismic data, a speed model and the seismic source wave field are read; 4. Fourier transform is performed on the seismic source wave field and the detector wave field in a time domain so that frequency-space domain wave field data are obtained; 5. depth continuation calculation is performed on the frequency-space domain wave field data; 6. migration imaging is performed by utilizing the principle of cross-correlation imaging or the principle of reflection coefficient imaging; 7. continuation calculation of the steps 4-6 is repeated to the maximum depth, the migration result is saved and the next shot of seismic data are calculated; and 8. the steps 3-7 are repeated to the last shot and a migration profile is outputted. According to the two-way wave pre-stack depth migration method through the one-way wave operator, full wave equation depth migration is performed by utilizing the one-way wave operator so that the rapid and accurate two-way wave depth migration algorithm is realized, and the method has more industrial utilization value.
Owner:CHINA UNIV OF GEOSCIENCES (BEIJING) +1

Method for preparing feldspar powder concentrate by mineral separation of aeolian sand in desert

The invention belongs to an industrial utilization method of aeolian sand in desert, in particular to a method for preparing feldspar powder concentrate by mineral separation of aeolian sand in desert. The method comprises an early-stage ferrum-removal process, a middle-stage feldspar flotation separation process and a later-stage ferrum-removal process. The early-stage ferrum-removal process comprises the following specific steps: firstly, carrying out dry magnetic separation on the aeolian sand in the desert; carrying out reselection and separation on the concentrate obtained after dry magnetic separation; carrying out powerful scrubbing and sizing-desliming on the concentrate obtained after reselection and separation; and carrying out wet magnetic separation to obtain the ferrum-removal concentrate for the middle-stage feldspar flotation separation process, and carrying out the later-stage ferrum-removal process on the feldspar mineral aggregate obtained in the middle-stage feldspar flotation separation process to finally obtain the feldspar powder concentrate. The processes of the invention have the advantages of water conservation, reduced energy consumption and low cost, and can fully utilize the existing aeolian sand resources to produce the high-quality feldspar powder concentrate.
Owner:CHANGSHA RES INST OF MINING & METALLURGY +1

Electron beam exposure patterning method on insulating substrate

The invention provides an electron beam exposure patterning method on an insulating substrate. The electron beam exposure patterning method comprises the following steps of: 1) providing the insulating substrate; 2) coating electron beam photoresist on the insulating substrate in a rotating way; 3) forming a metal film on the upper surface of the electron beam photoresist; 4) carrying out electron beam exposure to obtain a required photoetching pattern; 5) depositing to form a metal layer on the obtained photoetching pattern, so as to form a metal electrode; and 6) stripping, and removing the photoresist and redundant metal, so as to obtain a required metal pattern. According to the electron beam exposure patterning method on the insulating substrate, the double-layer electron beam photoresist is adopted for the exposure, an undercut structure beneficial to a follow-up metal stripping technology can be obtained by developing, discontinuous metal films are formed on the double-layer electron beam photoresist in an evaporating manner, then the electron beam exposure is carried out, and therefore, the electric charge on the surface of the insulating substrate can be effectively taken away, and as a result, a precise exposure pattern is formed. The patterning technology provided by the invention is applicable to the processing technology of micro-nanometer components on various insulating substrates, overcomes the shortcomings in the prior art, and has a high industrial utilization value.
Owner:SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI

Full-biodegradable high-barrier vacuum evaporation film and preparation method thereof

The invention discloses a biodegradable high-barrier vacuum evaporation film base material and a preparation method thereof. A film is sequentially composed of a high-barrier coating layer and a biaxially-oriented polylactic acid (BOPLA) film base material layer from top to bottom, wherein the base material layer consists of an upper surface layer, a core layer and a lower surface layer. The preparation method comprises the following two steps: firstly, preparing a polylactic acid film (BOPLA) base material meeting the coating requirement by using a horizontal drawing method, and then formingthe high-barrier coating layer on the surface of the film base material by using an online coating process or an offline coating process. According to an aluminum-plated film and an aluminum oxide-plated film which are produced by utilizing the high-barrier vacuum evaporation film base material prepared by the invention, the optimal oxygen permeability can be less than 0.02 cc/m<2>.24h, and the optimal water vapor permeability reaches 0.05 g/m<2>.24h; and the high-barrier vacuum evaporation film base material not only has an excellent barrier effect, but also is biodegradable, can effectivelysolve the environmental problem caused by waste packaging films, and is high in industrial utilization value.
Owner:广东华通新材料科技有限公司 +1

Apparatus for and method for filtering, treating and recycling seprobia

The invention relates to a sewage biofiltration treatment, reusing equipment and a method thereof, comprising a biochemical treatment unit and a depth filtering treatment unit. The biological treatment area in the biochemical treatment unit is located on the internal layer or the external layer of the equipment, and is filled with filling materials. The filtering area is located on the internal layer or the external layer of the equipment. The top surface of the biological treatment area is provided with a water intake and distribution area which is connected with a sewage intake pipe and the undersurface is provided with a distribution system. The interior of the biological area is divided into at least one treatment area which comprises an aerobic zone through an aeration system and an entire biochemical treatment unit is formed. The upper part of the intake and distribution areas is provided with a clear water area. A sand washer which is connected with the water intake area is arranged in the clear water area. The sewage biofiltration treatment has the advantages of integrity and flexibility, low investment, operation expenditure and cost, high automation level and so on. The processing effect can reach the reused water quality standard of the relevant sewage treatment. The reused water can be used for road sprinkling, greening and irrigating, car washing, floor cleaning, industrial utilization and so on.
Owner:UNIV OF SHANGHAI FOR SCI & TECH

Gravity type liquid quantitative water supply automatic closing apparatus

The invention discloses a gravity-typed liquid quantitative water supply automatic closing device, comprising a frame, a water outlet tap, a positioning seat with a container positioning ring wall, a water closing valve with a side linked rod, a water taking container, a pressure spring, a container positioning platform with circumferential balance side walls and an independent connection hook which can hook the linked rod of the water closing valve. The working principle of the device is that liquid is injected into the water taking container on the positioning seat by the tap of the water inlet and the water outlet; when the accumulated gravity of the liquid flowed in the water taking container gradually presses the pressure spring to move downwards and synchronously drive the linked rod beside the water closing valve to move downwards, the water is injected continuously and the gravity presses down the pressure spring till the water inlet is closed when the quantitative water supply operation is completed as the quantitative liquid is injected into the water taking container. The gravity-typed liquid quantitative water supply automatic closing device can improve the collection work on the liquid with extremely low flowing speed, consumes no electric energy, and has no pollution, extremely low cost and high industrial utilization value.
Owner:李静娴

Photo-curing three-dimensional printing device based on UV LED micro-display technology and printing method of photo-curing three-dimensional printing device

The invention discloses a photo-curing three-dimensional printing device based on a UV LED micro-display technology and a printing method of the photo-curing three-dimensional printing device. The photo-curing three-dimensional printing device comprises a computer system, a controller, a UV LED micro-display device, a trough, a forming table and a lifting device. According to the device, slice images obtained by the computer system directly are transmitted to the UV LED micro-display device or a projection display device through the controller, so that corresponding UV images are formed from the slice images on a printing work surface of the trough, thin layer structures of corresponding images are obtained through curing forming of photo-cured resin in the trough under irradiation of the UV images and are accumulated through the lifting device, and a photo-curing three-dimensional printing product is obtained. The UV LED micro-display device is taken as a photo-curing light source, rapid three-dimensional forming of the photo-cured resin is realized, resolution and printing precision are improved effectively, power consumption is reduced, productivity is improved, and the device has certain industrial utilization value.
Owner:FOSHAN INST SUN YAT SEN UNIV +1
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