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Optical glass and projection aligner using the same

A technology of optical glass and projection optical system, which is applied in the field of optical glass and projection exposure devices using the optical glass, and can solve the problems of low transmittance in the ultraviolet band of optical glass and the like

Inactive Publication Date: 2005-04-06
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, the problem of low transmittance in the ultraviolet band of the obtained optical glass is caused.

Method used

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  • Optical glass and projection aligner using the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0051] Optical glass (test piece, 100 g) having the composition shown in Table 1 was produced in the following procedure. First, raw materials of types and weights corresponding to the components shown in Table 1 were charged into a quartz crucible, and were melted under conditions of 1150 to 1300° C. in the air while being thoroughly mixed. Next, the content in the quartz crucible was transferred into a platinum crucible, and refined (refining) for 15 minutes under the condition of 1200-1300° C. in the atmosphere to remove air bubbles in the content. Then the contents in the platinum crucible were stirred evenly. The contents of the platinum crucible are then poured into a mold whose temperature has been pre-adjusted to 500°C and allowed to cool slowly. Furthermore, the slowly cooled glass was cut and ground to obtain a 100-g test piece.

Embodiment 2～ Embodiment 11

[0053] Test pieces (100 g) of various optical glasses were produced in the same manner as in Example 1 except that the types and usage amounts of each raw material were changed according to the component compositions shown in Table 1 or Table 2.

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Abstract

The optical glass of the present invention comprises a composition in terms of weight ratio within the range of 0 to 14.8 wt% of SiO2, 30 to 60 wt% of B2O3, 0 to 17.5 wt% of Al2O3, 0 to 0.4 wt% of Li2O, 0 to 3 wt% of Na2O, 0 to 3 wt% of K2O, 0 to 5 wt% of MgO, 0 to 30 wt% of CaO, 0 to 30 wt% of SrO, 0 to 35 wt% of BaO, where RO (MgO + CaO + SrO + BaO) is 8 to 35 wt%, 0 to 20 wt% of ZnO, 0 to 6.5 wt% of La2O3, 0 to 15 wt% of Gd2O3, 0 to 15 wt% of Y2O3, 0 to 10 wt% of Ta2O3, 0 to 9.5 wt% of ZrO2, 0 to 1 wt% of As2O3, and 0 to 0.5 wt% of Sb2O3; and has a refractive index (nd) of 1.52 to 1.65, an Abbe number ( nu d) of 55 to 61, and an 80% transmission wavelength (at a thickness of 10 mm including no reflection loss) of 330 nm or shorter.

Description

technical field [0001] The invention relates to an optical glass and a projection exposure device using the optical glass. The basic composition of the optical glass is B 2 o 3 -RO (where R represents Mg, Ca, Sr and Ba), refractive index (nd) is 1.52-1.65, Abbe number (νd) is 55-61, 80% transmission wavelength (10mm thick, excluding reflection loss ) below 330nm. Background technique [0002] In recent years, with the expansion of the use of optical systems, the opportunities to design and use optical glass in the ultraviolet range are increasing day by day. Therefore, there is an increasing demand year by year for the development of optical glasses having various optical constants and excellent transmittance in the ultraviolet band. [0003] So far, most of the known optical glasses have optical constants such as the refractive index (nd) of 1.52-1.65 and the Abbe number (νd) in the range of 55-61. SiO 2 -B 2 o 3 -Al 2 o 3 - Optical glass represented by BaO system h...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C3/064C03C3/14
CPCC03C3/064C03C3/15Y10S501/903C03C3/068
Inventor 木户一博杉崎雅彦松丸志津男
Owner NIKON CORP