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Peltier heat circulation nano impressing device

A micro-nano, thermal cycle technology, used in stamping, printing, optics, etc., to achieve the effect of beautiful appearance, shortened heating and cooling time, and simplified transmission mechanism

Inactive Publication Date: 2006-11-01
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If a reasonable design can be adopted to overcome the shortcomings of temperature soft curing, then such micro-nano imprinting technology can be regarded as a low-cost, high-efficiency, high-quality imprinting technology.

Method used

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  • Peltier heat circulation nano impressing device
  • Peltier heat circulation nano impressing device
  • Peltier heat circulation nano impressing device

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Embodiment Construction

[0021] The present invention will be further described below in conjunction with drawings and embodiments.

[0022] Such as figure 1 , figure 2 Shown, the present invention structure is as follows:

[0023] 1) A vacuum cover 5 is installed on the workbench 11. The upper part of the vacuum cover 5 is equipped with a connection block 3 that extends into the vacuum cover 5 and the other end can move axially outside the vacuum cover 5. A spring 4 is installed between the inner shoulder surface of one end of the connection block 3 and the upper end surface of the vacuum cover 5, the upper end surface of the connection block 3 is connected with the movable end of the hydraulic piston 2, and the other end of the hydraulic piston 2 is installed on the beam of the support frame 1, and the support frame 1 It is fixedly connected with the workbench 11, and the upper heating plate 7 installed in the vacuum cover 5 is connected with the lower end surface of the connecting block 3 throug...

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PUM

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Abstract

The invention discloses a Peltier thermal cycle micro-nano imprinting device. A vacuum cover is installed on the workbench, and a connecting block with one end extending into the vacuum cover and the other end moving axially outside the vacuum cover is installed on the upper part of the vacuum cover. A spring is installed between the connecting block extending outside the vacuum cover and the vacuum cover. The upper end surface is connected with the hydraulic piston end, the upper heating plate installed in the vacuum cover is connected with the lower end surface of the connection block through heat-insulating ceramics, and the lower heating plate is fixedly connected with the worktable through heat-insulating ceramics; the upper and lower heating plates are made of stainless steel The inner plate and the stainless steel outer plate are composed of a double-layer structure. The outer plate has a mesh cooling flow channel and has a flow channel interface to connect with the outside. The inner surface of the inner plate between the two layers is embedded with four symmetrically distributed square semiconductor thermoelectric coolers. A temperature sensor is installed between the refrigerator and the refrigerator on both sides of a radial line. Using a refrigerator based on the Peltier thermal cycle principle shortens the heating and cooling time, which is conducive to improving production efficiency; the temperature change curve is more gentle, which is convenient for precise temperature control and improved product quality.

Description

technical field [0001] The invention relates to micro-nano imprinting technology (NIL), in particular to a Peltier thermal cycle micro-nano imprinting device. Background technique [0002] Stephen Y Chou of Princeton University first proposed micro-nano imprinting technology in 1995 and formally confirmed it in 1996. The process of its determined nanoimprint technology has become a recognized typical process. The process can be divided into three steps: (1) making stamps, that is, using traditional micro-etching technology to make embossed stamps with micro-nano feature sizes; (2) embossing process, that is, applying precise control on the imprinting machine Pressure and temperature, use a stamp to press out the desired pattern on the PMMA coated on the element substrate, and then cure the PMMA; (3) transfer the pattern, that is, transfer the pattern on the imprinted PMMA to the element substrate by etching, for mass production. [0003] Since Chou proposed nanoimprint te...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/00B41K1/00B41M5/00
Inventor 傅建中陈子辰贺永张海峰
Owner ZHEJIANG UNIV
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