Process for preparing zone-melted vapor doping solar cell silicon single crystal
A solar cell, gas phase doping technology, applied in the direction of single crystal growth, single crystal growth, self-regional melting method, etc., can solve the problems of silicon single crystal radial and axial resistivity inhomogeneity
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[0017] Referring to Figure 1, the process flow of zone melting vapor phase doping of silicon single crystal for solar cells is:
[0018] Furnace cleaning, furnace loading→evacuation, gas filling, preheating→chemical material, seeding→setting the doping gas setting value→slimming the neck→opening the doping gas→expanding the shoulder, filling nitrogen gas→turning the shoulder, maintaining→finishing, Stop the furnace and stop the doping gas.
[0019] The doping gas uses phosphine PH 3 , Borane B 2 h 6 , Phosphine PH 3 Mixed gas with argon Ar, borane B 2 h 6 Any one of the four doping gases mixed with argon Ar; Phosphine PH 3 Phosphine PH of mixed gas with argon Ar 3 The relative concentration of argon Ar should be 0.0001% ≤ phosphine PH 3 2 h 6 Mixed gas with argon Ar and its borane B 2 h 6 The relative concentration of argon Ar should be 0.0001% ≤ borane B 2 h 6 <100%.
[0020] In the process of evacuating, inflating, and preheating, argon gas is rapidly charged i...
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