Method of processing quartz member for plasma processing device, quartz member for plasma processing device, and plasma processing device having quartz member for plasma processing device mounted ther
A plasma and treatment device technology, which is applied in the process of producing decorative surface effects, semiconductor/solid-state device manufacturing, decorative arts, etc., and can solve the problems of contaminating the surface of the object to be treated and reducing the yield of finished products.
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no. 1 approach
[0023] The configuration of a plasma processing apparatus according to a first embodiment of the present invention will be described with reference to FIGS. 1 and 2 . FIG. 1 is a schematic cross-sectional view showing a plasma processing apparatus according to a first embodiment of the present invention, and FIG. 2 is a diagram showing the shape of a quartz member according to this embodiment. Fig. 2 (a) is the plane view of focusing ring 19, Fig. 2 (b) is the sectional view of AA' of Fig. 2 (a), Fig. 2 (c) is the plan view of shielding ring 25, Fig. 2 (d) is The sectional view of BB' of Fig. 2(c).
[0024] As shown in FIG. 1 , this plasma processing apparatus has a cylindrical processing container 1 made of aluminum or the like, and an upper electrode 2 and a lower electrode 3 arranged to face each other in the processing container 1 .
[0025] Openings 4 and 5 are provided on the side wall of the processing container 1 for taking in or taking out, for example, a semiconduct...
no. 2 approach
[0051] The processing method of the quartz component for the plasma processing apparatus of the second embodiment is, after diamond grinding, carry out thermal polishing (fire-polish) as heat treatment by burner etc., then by particle size, be about 500# for example (the first particle size) for surface processing, such as sandblasting or grinding, and finally, wet etching with hydrofluoric acid (HF). Before the thermal polishing treatment, if necessary, the abrasive material with a particle size of 320-400# can also be used for surface processing, such as sandblasting processing.
[0052] As described in the first embodiment, when performing surface treatment of quartz components for plasma processing equipment, it is very important to maintain basic unevenness that can adhere and hold deposits, and not to generate microcracks. .
[0053] For this purpose, first, the surface of the quartz part surface-processed by the following five treatment methods was observed with an ele...
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