Surface modification method of ceramic cutting tool
A technology of ceramic cutting tools and surface modification, applied in the field of surface modification of ceramic cutting tools and MEVVA ion implantation surface modification method of ceramic cutting tools, can solve the problems of poor wear behavior, difficulty in applying negative bias, and high wear coefficient, To achieve the effect of reducing friction and wear and friction coefficient, reducing micro-crack propagation, and improving cutting ability
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Embodiment 1
[0025] A method for surface modification of ceramic cutters, the method uses MEVVA implantation technology to carry out surface modification on cleaned cutters (the cutters are crystalline alumina and hot-pressed silicon nitride ceramic cutters); the implanted ions are 0.6×10 17 ions / cm 2 Titanium, 5×10 17 ions / cm 2 Zirconium, 3×10 17 ions / cm 2 Chrome, 9×10 17 ions / cm 2 of molybdenum and / or 8 x 10 17 ions / cm 2 The tungsten; the accelerating voltage of MEVVA is 70kV; the average ion current intensity is 2mA; the base vacuum of the MEVVA is 8×10 -4 Pa;
[0026] After MEVVA ion implantation, the ion implantation depth of the ceramic tool is 300nm.
Embodiment 2
[0028] A method for surface modification of ceramic cutters, the method uses MEVVA implantation technology to carry out surface modification on cleaned cutters (the cutters are crystalline alumina and hot-pressed silicon nitride ceramic cutters); the implanted ions are 0.3×10 17 ions / cm 2 Titanium, 2×10 17 ions / cm 2 Zirconium, 7×10 17 ions / cm 2 The chromium; the accelerating voltage of MEVVA is 30kV; the average ion current intensity is 4mA; the base vacuum of the MEVVA is 3×10 -4 Pa;
[0029] After MEVVA ion implantation, the ion implantation depth of the ceramic tool is 100nm.
Embodiment 3
[0031] A method for surface modification of ceramic cutters, the method uses MEVVA implantation technology to carry out surface modification on cleaned cutters (the cutters are crystalline alumina and hot-pressed silicon nitride ceramic cutters); the implanted ions are 0.1×10 17 ions / cm 2 Titanium, 4×10 17 ions / cm 2 Zirconium, 8×10 17 ions / cm 2 Chrome, 4×10 17ions / cm 2 The molybdenum; the accelerating voltage of MEVVA is 50kV; the average ion current intensity is 3mA; the base vacuum of the MEVVA is 4×10 -4 Pa;
[0032] After MEVVA ion implantation, the ion implantation depth of the ceramic tool is 50nm.
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