Method for preparing nano dot array of controllable unit size using nano ball template

A technology of nano-dot array and unit size, applied in the field of nano-dot array

Inactive Publication Date: 2005-03-02
TSINGHUA UNIV
View PDF0 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In summary, there is currently no high-density dot array preparation technology directly based on nano (micro) ball te

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing nano dot array of controllable unit size using nano ball template
  • Method for preparing nano dot array of controllable unit size using nano ball template
  • Method for preparing nano dot array of controllable unit size using nano ball template

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] Controllable expansion of deposition channels in single-layer and double-layer polystyrene nanosphere templates (sphere diameter 200 nm) was performed by oxygen plasma etching. Then, a layer of metal aluminum is evaporated on the template, and polystyrene spheres are dissolved in toluene solvent to obtain a regularly arranged array of nano-dots.

[0023] The effect of plasma etching on the expansion of deposition channels in the template and the preparation of nanodot arrays can be characterized by scanning electron microscopy (SEM). The high-density polystyrene template can be seen from the SEM photo before the plasma etching process figure 1 In (a), it can be seen that the original deposition channel in the template is blocked due to the obvious deformation of the polystyrene sphere with a diameter of 200 nm, thus making the template unusable. figure 1 (b) shows the effect of assembling polystyrene spheres with a diameter of 440nm into a template. It can be seen that...

Embodiment 2

[0030] The implementation process is similar to that of Example 1, except that the spheres used for the template are changed to other diameters: 0.01-10 μm.

Embodiment 3

[0032] The implementation process is similar to Example 1, except that the balls used as the template are changed into nano (micro) balls of other materials, such as polybutadiene, polyisoprene, SiO 2 , Ag, Au, Co, FePt, etc.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Diameteraaaaaaaaaa
Login to view more

Abstract

This invention disclose a method of availing of micro millimeter ball template prepares micro millimeter lattice array of controlled cell size, the method belongs to micro millimeter photo etching technique field. It makes use of plasma ion etching to control size of sedimentation access of micro millimeter ball template, combines with filming step and cleaning step in micro millimeter photo etching technique, thereby acquires micro millimeter lattice array of controlled cell size. The density of micro millimeter lattice array in the lecture experiment is 42G/in2, and it controls cell size in 26-100nm. This method builds directly upon the control of sedimentation access of template, it applies to lattice array of all kinds of stuff. By means of conjoining thin film technique of disparity stuff, micro millimeter ball photo etching technique which is modified by this method could prepare high density micro millimeter lattice array of disparity stuff and controlled cell size. It could use for device based on micro millimeter lattice array, for instance, magnetic store, preparation of transducer and performance optimization of device based on controlled cell size.

Description

technical field [0001] The invention belongs to the technical field of nanometer photolithography. In particular, it relates to a method for preparing a nano-dot array with controllable unit size by using a nano-ball template to control the size of a deposition channel in a nano-ball template by using plasma etching. Background technique [0002] Using nanosphere photolithography to prepare dot arrays is a cheap and simple method compared with photolithography. J.C.Hulteen and R.P.V.Duyne, etc. reported in "Nanosphere lithography: A materials general fabrication process for periodic particle array surfaces" in the document "J.Vac.Sci.Technol.A 13, 1553 (1995)", using nano (micro) meters Regular holes in the ball template are used as deposition channels to prepare regular dot arrays. The density of the dot array increases with the shrinkage of the template balls, while the unit size of the dot array decreases accordingly. However, in the high-density application of polymer ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G03F7/20H01L21/00
Inventor 吴培文庹新林王晓工袁俊
Owner TSINGHUA UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products