Flexible metal foil-polyimide laminate and making method
A technology of polyimide layer and laminated material, applied in metal layered products, printed circuit manufacturing, circuit substrate materials, etc., can solve problems such as uneconomical, achieve low lamination temperature, high adhesive strength, low drying effect of temperature
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Embodiment 1-4
[0031] Laminate Preparation
[0032] The polyamic acid varnish prepared above was coated on a rolled copper foil test piece with a thickness of 30 cm x 25 cm and a thickness of 35 microns by using an applicator, and the thickness of the wet coating was 30 microns. The coating was dried in a 120°C oven for 2 minutes. A 30 cm x 25 cm, 25 micron thick polyimide film as listed in Table 1 was laminated over the varnish coat. Pressure lamination was carried out using a test roll laminator (Nishimura Machinery Co., Ltd.) at 120°C and a pressure of 15 kg / cm at a rate of 4 m / min. The laminated coupons were heat treated continuously at 160°C for 4 hours, at 250°C for 1 hour, and then at 350°C for 1 hour in a nitrogen-filled oven. The resulting laminate consisted of a 35 micron thick copper foil and a 28 micron thick polyimide layer (adhesive layer + polyimide film).
[0033] DMAc transmittance of polyimide film
[0034] Such as figure 1 As shown, DMAc indicated by 2 has been poured...
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