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Control system of large stroke nanometer precision location

A positioning control and control system technology, applied in the direction of control system, general control system, control/adjustment system, etc., can solve the problems of incompetence in high-precision positioning, and achieve the effects of fast processing speed, convenient application and high sensitivity

Inactive Publication Date: 2006-04-12
SUN YAT SEN UNIV
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  • Summary
  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

None of the existing monitoring and positioning systems can fully meet these indicators, and can only make up for its defects through mathematical methods, and it is even more incompetent in realizing high-precision positioning with large interference

Method used

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  • Control system of large stroke nanometer precision location
  • Control system of large stroke nanometer precision location
  • Control system of large stroke nanometer precision location

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Experimental program
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Embodiment Construction

[0026] The present invention will be further described below in conjunction with the accompanying drawings.

[0027] The present invention provides a long-stroke nano-precision positioning control system for the stability of the monitoring system. This system uses light intensity to reflect the control method of optical path difference information. The optical path diagram of this method is as follows figure 1 shown. With a horizontally polarized He-Ne laser light source 1, a polarizer can be added to obtain linearly polarized light, which is incident on the first half-mirror 2 from the left and then divided into two beams a and b, respectively incident on the Michelson interference The two arms 91, 92 of the instrument add a half-wave plate 4 and a quarter-wave plate 5 in the optical path, as shown in the figure, then after the two beams of light pass through the quarter-wave plate 5, they will respectively Become a left-handed circularly polarized light and a right-handed c...

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PUM

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Abstract

This invention relates to a location control system used in the accurate measurement or experiment including a light source, two semi-reflecting and semi-transparent mirrors, an interferometer, one half-wave plate, a quarter-wave plate, an analyzer and an analysis control system, in which, an optical path starts from the light source to enter into the first semi-reflecting and semi-transparent mirror to be split into two beams of lights to be input into the two arms of the interferometer separately, after the light passing through the arm passes through the semi-wave is merged into a beam with the light passing through the arm at the second semi-reflecting and semi-transparent mirror to be emitted into a light sensing device of the analysis control system after passing through the quarter plate. This invention installs an arm of the interferometer onto a step motor with multiple level accuracies, the least range accuracy of which is the nm level, the control end analyses and controls the connection of the system.

Description

technical field [0001] The invention relates to a positioning control system used in high-precision measurement or experiment, more specifically a control system capable of positioning with nanometer precision. technical background [0002] In high-precision measurement or experimental systems, there are often high requirements for the stability of the entire system, especially the positional relationship between instruments, even if there is a small disturbance, it will lead to completely different measurement or experimental results. Therefore, in a high-precision measurement or experiment system, the requirements for the measurement or experiment environment are very high, and generally it needs to be carried out in a highly isolated environment, such as an ultra-clean laboratory. But even in a highly isolated environment, due to the movement of personnel, the operation of instruments, and even the flow of air, there are disturbances to measurements or experiments. Ultra...

Claims

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Application Information

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IPC IPC(8): G05D3/12G05D3/20G05B13/02G05B15/02H02P8/22
Inventor 王自鑫周建英赖天树郭晶
Owner SUN YAT SEN UNIV
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