Apparatus including 4-way valve for fabricating semiconductor device, method of controlling valve, and method of fabricating semiconductor device using the apparatus
Patent Information
- Authority / Receiving Office
- CN ยท China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SAMSUNG ELECTRONICS CO LTD
- Publication Date
- 2006-08-30
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Abstract
Description
technical field
[0001] The present invention relates to an apparatus for manufacturing semiconductor devices, and more particularly, to an apparatus for employing a 4-way valve by improving the valve system for supplying gas to a reaction chamber with improved purge (purge) An apparatus for efficiently manufacturing a semiconductor device, a method for controlling the 4-way valve, and a method for manufacturing a semiconductor device using the apparatus. Background technique
[0002] Semiconductor devices are manufactured by repeatedly performing processes such as deposition and patterning of thin layers on the surface of a substrate, that is, a wafer. Deposition and patterning of the thin layers is typically done in a semiconductor processing module. The configuration of a semiconductor processing module varies depending on the process used in the process of manufacturing semiconductor devices, but it basically includes a reaction chamber defining a reaction area in which ...