Step scan photo-etching machine double-platform exchanging and positioning system

A positioning system and step-scanning technology, which is applied in the direction of optomechanical equipment, microlithography exposure equipment, optics, etc., can solve the problems of increased cost, very high precision requirements, increased system manufacturing costs, etc., to reduce time-consuming, reduce Cost, the effect of effective cost control

Active Publication Date: 2006-09-06
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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Problems solved by technology

[0007] The structure of the above-mentioned patent is simple and reliable in operation, and overcomes the shortcomings of the first solution mentioned above, but it is very obvious that, compared with the previous one, this structure has an extra set of alignment devices and upper and lower film devices, and the cost A significant increas

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  • Step scan photo-etching machine double-platform exchanging and positioning system
  • Step scan photo-etching machine double-platform exchanging and positioning system
  • Step scan photo-etching machine double-platform exchanging and positioning system

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[0038] The present invention will be described in detail below with reference to the drawings and specific embodiments.

[0039] Figure 5 Shows the state of the dual wafer stage positioning system of the present invention when it is working, and its structure includes a master base 1, a wafer stage positioning unit set on the master base and running at the exposure station, and a wafer stage positioning unit running at the pretreatment station. Wafer stage positioning unit, each wafer stage positioning unit includes a wafer carrier device 2a (silicon wafer carrier device of the pretreatment station), 2b (silicon wafer carrier device of the exposure station), and motion positioning detection devices 50a, 51a , 50b, 51b; x-direction guide rail 10a, or 10b, 11b; y-direction guide rail 20a, 21a or 20b, 21b, each silicon wafer carrying device is installed on x-direction guide rail, can move along x-direction guide rail, and x-direction guide rail installation It can move along the y-d...

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Abstract

Wherein, it sets one/two x-direction guide rail on pre-treating position and exposure position respectively. This invention reduces time consumption for exchange of exposure position and exposure time of every silicon slice, simplifies system, and improves system efficiency and reliability.

Description

technical field [0001] The invention belongs to the field of precise positioning, in particular to a movement positioning device for silicon wafers in the semiconductor industry. Background technique [0002] The photolithography process refers to the exposure and transfer of the chip pattern on the mask to the silicon wafer, which is one of the important processes in the production and manufacture of integrated circuit chips. A photolithography process includes multiple sub-processes: loading and unloading, pre-alignment, alignment, exposure, etc. The throughput of the system is determined by the running speed of each sub-process. [0003] A typical lithographic apparatus is a silicon wafer stage structure, such as figure 1 As shown, the system is mainly composed of an illumination system 16, a mask stage positioning system 15, a projection objective lens system 14, a silicon wafer stage motion positioning system 2, and a focusing and leveling detection system 13, among w...

Claims

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Application Information

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IPC IPC(8): G03F7/20H01L21/68G03F9/00
CPCG03F7/70716G03F7/70733
Inventor 李映笙李小平
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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