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Step scan photo-etching machine double-platform exchanging and positioning system

A positioning system and step-scanning technology, which is applied in the direction of optomechanical equipment, microlithography exposure equipment, optics, etc., can solve the problems of increased cost, very high precision requirements, increased system manufacturing costs, etc., to reduce time-consuming, reduce Cost, the effect of effective cost control

Active Publication Date: 2006-09-06
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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Problems solved by technology

[0007] The structure of the above-mentioned patent is simple and reliable in operation, and overcomes the shortcomings of the first solution mentioned above, but it is very obvious that, compared with the previous one, this structure has an extra set of alignment devices and upper and lower film devices, and the cost A significant increase
Alignment devices or focusing and leveling devices require very high precision, regardless of the processing and manufacturing of the device itself, and the installation requirements of the device are also double the control requirements of a single alignment device, all of which significantly increase the manufacturing of the system cost

Method used

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  • Step scan photo-etching machine double-platform exchanging and positioning system
  • Step scan photo-etching machine double-platform exchanging and positioning system
  • Step scan photo-etching machine double-platform exchanging and positioning system

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Embodiment Construction

[0038] The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0039] Figure 5It shows the working state of the dual wafer stage positioning system of the present invention, and its structure includes a total base 1, a wafer stage positioning unit arranged on the total base and operating at the exposure station, and a wafer stage positioning unit operating at the pretreatment station Wafer stage positioning unit, each wafer stage positioning unit includes silicon wafer carrier device 2a (silicon wafer carrier device for pretreatment station), 2b (silicon wafer carrier device for exposure station), motion positioning detection device 50a, 51a , 50b, 51b; x guide rail 10a, or 10b, 11b; y guide rail 20a, 21a or 20b, 21b, each silicon chip carrier is installed on the x guide rail, can move along the x guide rail, x guide rail installation On the y guide rail and can move along the y guide rail, the x guide...

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PUM

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Abstract

Wherein, it sets one / two x-direction guide rail on pre-treating position and exposure position respectively. This invention reduces time consumption for exchange of exposure position and exposure time of every silicon slice, simplifies system, and improves system efficiency and reliability.

Description

technical field [0001] The invention belongs to the field of precise positioning, in particular to a movement positioning device for silicon wafers in the semiconductor industry. Background technique [0002] The photolithography process refers to the exposure and transfer of the chip pattern on the mask to the silicon wafer, which is one of the important processes in the production and manufacture of integrated circuit chips. A photolithography process includes multiple sub-processes: loading and unloading, pre-alignment, alignment, exposure, etc. The throughput of the system is determined by the running speed of each sub-process. [0003] A typical lithographic apparatus is a silicon wafer stage structure, such as figure 1 As shown, the system is mainly composed of an illumination system 16, a mask stage positioning system 15, a projection objective lens system 14, a silicon wafer stage motion positioning system 2, and a focusing and leveling detection system 13, among w...

Claims

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Application Information

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IPC IPC(8): G03F7/20H01L21/68G03F9/00
CPCG03F7/70716G03F7/70733
Inventor 李映笙李小平
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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